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arXiv 1601.05930cond-mat.mtrl-sci
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拓扑绝缘体ZrTe $_5$理想表面台阶边的鲁棒拓扑边态

Robust topological edge states at the perfect surface step edge of topological insulator ZrTe$_5$

Xiang-Bing Li, Wen-Kai Huang, Yang-Yang Lv, Kai-Wen Zhang, Chao-Long Yang, Bin-Bin Zhang, Y. B. Chen, Shu-Hua Yao, Jian Zhou, Ming-Hui Lu, Li Sheng, Shao-Chun L… 展开作者

Xiang-Bing Li, Wen-Kai Huang, Yang-Yang Lv, Kai-Wen Zhang, Chao-Long Yang, Bin-Bin Zhang, Y. B. Chen, Shu-Hua Yao, Jian Zhou, Ming-Hui Lu, Li Sheng, Shao-Chun Li, Jin-Feng Jia, Qi-Kun Xue, Yan-Feng Chen, Dingyu Xing

摘要:

本文报道了利用扫描隧道显微镜对ZrTe $_5$的原子尺度特性的研究。我们观察到一个80 meV的体带隙与拓扑边缘状态的台阶边缘,从而证明$_5$是一个二维的拓扑绝缘体。研究还发现,外加磁场诱导拓扑边缘态的能量分裂和空间分离,这可以归因于拓扑边缘态与体拓扑之间的强联系。完美的表面台阶和相对较大的禁带宽度使ZrTe $_5$成为未来基础研究和器件应用的潜在候选材料。

英文摘要:

We report an atomic-scale characterization of ZrTe$_5$ by using scanning tunneling microscopy. We observe a bulk bandgap of ~80 meV with topological edge states at the step edge, and thus demonstrate ZrTe$_5$ is a two dimensional topological insulator. It is also found that an applied magnetic field induces energetic splitting and spatial separation of the topological edge states, which can be attributed to a strong link between the topological edge states and bulk topology. The perfect surface steps and relatively large bandgap make ZrTe$_5$ be a potential candidate for future fundamental studies and device applications.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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