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arXiv 0912.4477cond-mat.mes-hallcond-mat.mtrl-sci
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强拓扑绝缘体表面台阶边缘的散射

Scattering from Surface Step Edges in Strong Topological Insulators

Rudro R. Biswas, Alexander V. Balatsky

摘要:

研究了强拓扑绝缘体(STI)表面台阶边缘处的散射过程的特性,由于时间反演对称性和沿台阶边缘的平移不变性对$S$ -矩阵\emph{solely}施加了限制.我们表明,“完美反射”的步骤边缘,可以定义与这些限制允许调制的局部状态密度(LDOS)附近的步骤边缘衰减不慢于$1/x$,其中$x$是从步骤边缘的距离。这比二维电子气(2DEG)中的速度更快--在2DEG中LDOS以$1/\sqrt{x}$形式衰减--并且与STI表面状态中的反向散射抑制具有相同的原因。我们还计算了在δ函数散射势下的散射,并认为\emph{generic}阶跃边缘将产生LDOS振荡的$x^{-3/2}$衰减。实验的影响进行了讨论。

英文摘要:

We study the characteristics of scattering processes at step edges on the surfaces of Strong Topological Insulators (STI), arising from restrictions imposed on the $S$-matrix \emph{solely} by time reversal symmetry and translational invariance along the step edge. We show that the `perfectly reflecting' step edge that may be defined with these restrictions allow modulations in the Local Density of States (LDOS) near the step edge to decay no slower than $1/x$, where $x$ is the distance from the step edge. This is faster than in 2D Electron Gases (2DEG) --- where the LDOS decays as $1/\sqrt{x}$ --- and shares the same cause as the suppression of backscattering in STI surface states. We also calculate the scattering at a delta function scattering potential and argue that \emph{generic} step edges will produce a $x^{-3/2}$ decay of LDOS oscillations. Experimental implications are also discussed.

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