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arXiv 1507.01094cond-mat.mtrl-scicond-mat.mes-hall
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微米宽原子台阶La0 .7Sr0.3MnO3薄膜的外延生长及性能

Epitaxial growth and properties of La0.7Sr0.3MnO3 thin films with micrometer wide atomic terraces

Wei Yuan, Yuelei Zhao, Chi Tang, Tang Su, Qi Song, Jing Shi, Wei Han

摘要:

采用脉冲激光沉积法在SrTiO 3(100)衬底上外延生长了宽原子台阶的La0.7Sr0.3MnO3(LSMO)薄膜。原子力显微镜测量表明,LSMO薄膜的原子台阶约为4 μ m,原子平台宽度大于2 μ m。对于20个单层(ML)的LSMO膜,在室温下的磁化强度被确定为255 ± 15 emu/cm 3,对应于每个Mn原子1.70 ± 0.11玻尔磁子。当LSMO的厚度从8 μ L增加到20 μ L时,温度依赖的绝缘体到金属行为转变的临界厚度被示出为9 μ L。此外,在氧气环境中的后退火改善了LSMO薄膜的电子输运和磁性。

英文摘要:

La0.7Sr0.3MnO3 (LSMO) films with extraordinarily wide atomic terraces are epitaxially grown on SrTiO3 (100) substrates by pulsed laser deposition. Atomic force microscopy measurements on the LSMO films show that the atomic step is ~ 4 Å and the atomic terrace width is more than 2 micrometers. For a 20 monolayers (MLs) LSMO film, the magnetization is determined to be 255 +- 15 emu/cm3 at room temperature, corresponding to 1.70 + - 0.11 Bohr magneton per Mn atom. As the thickness of LSMO increases from 8 MLs to 20 MLs, the critical thickness for the temperature dependent insulator-to-metal behavior transition is shown to be 9 MLs. Furthermore, post-annealing in oxygen environment improves the electron transport and magnetic properties of the LSMO films.

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