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arXiv 1502.03718cond-mat.mes-hall
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二维拓扑绝缘体中缺陷诱导的电子态

Electronic states induced by nonmagnetic defects in two-dimensional topological insulators

Vladimir A. Sablikov, Aleksei A. Sukhanov

摘要:

我们研究了二维拓扑绝缘体中具有短程势的缺陷引起的带隙电子态,并追踪了它们随缺陷与边界距离变化的演化。发现远离边界的缺陷产生两个束缚态,与其势的符号无关。这些态被分为类电子态和类空穴态。这些状态中的每一个可以具有两种类型的电子密度的空间分布。第一类态的中心密度最大,第二类态的中心密度最小。当缺陷与边界耦合时,束缚态相应地转变为两种共振态,并呈现出边缘态的形式。在一定条件下,两个共振干涉引起的边缘状态流动周围的缺陷的连续谱嵌入的束缚态的形成。我们计算了缺陷周围流动的边缘态电子密度的空间分布,并估计了缺陷附近积累的电荷。在缺陷周围流动的边缘态电流密度场包含两个分量,一个分量在缺陷周围流动,另一个分量在缺陷周围循环。

英文摘要:

We study in-gap electronic states induced by a nonmagnetic defect with short-range potential in two-dimensional topological insulators and trace their evolution as the distance between the defect and the boundary changes. The defect located far from the boundary is found to produce two bound states independently of the sign of its potential. The states are classified as electronlike and holelike. Each of these states can have two types of the spatial distribution of the electron density. The first-type states have a maximum of the density in the center and the second-type ones have a minimum. When the defect is coupled with the boundary, the bound states are transformed correspondingly into resonances of two types and take up the form of the edge states flowing around the defect. Under certain conditions, two resonances interfere giving rise to the formation of a bound state embedded into the continuum spectrum of the edge states flowing around the defect. We calculate the spatial distribution of the electron density in the edge states flowing around the defect and estimate the charge accumulated near the defect. The current density field of the edge states flowing around the defect contains two components one of which flows around the defect and the other circulates around it.

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