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arXiv 1304.4629cond-mat.supr-con
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退火对a-Nb(x)Si(1-x)薄膜超导性能的影响

Effect of annealing on the superconducting properties of a-Nb(x)Si(1-x) thin films

O. Crauste, A. Gentils, F. Couëdo, Y. Dolgorouky, L. Bergé, S. Collin, C. A. Marrache-Kikuchi, L. Dumoulin

摘要:

用透射电子显微镜(TEM)研究了厚度小于25 μ m的a-Nb(x)Si(1-x)薄膜的结构。沉积态或退火态薄膜在退火温度高达500°C时,其组成和厚度是连续和均匀的。我们已经进行了低温运输测量这些薄膜接近超导体到绝缘体的转变(SIT),并显示出退火或组合物的效果之间的质的差异,和减少的膜厚度上的超导性能的a-NbSi。这些结果质疑薄层电阻R_平方作为描述SIT的相关参数的相关性。

英文摘要:

a-Nb(x)Si(1-x) thin films with thicknesses down to 25 Å have been structurally characterized by TEM (Transmission Electron Microscopy) measurements. As-deposited or annealed films are shown to be continuous and homogeneous in composition and thickness, up to an annealing temperature of 500°C. We have carried out low temperature transport measurements on these films close to the superconductor-to-insulator transition (SIT), and shown a qualitative difference between the effect of annealing or composition, and a reduction of the film thickness on the superconducting properties of a-NbSi. These results question the pertinence of the sheet resistance R_square as the relevant parameter to describe the SIT.

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