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arXiv 1302.3935cond-mat.mtrl-scicond-mat.mes-hallphysics.optics
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单层MoS2的二次谐波显微镜

Second harmonic microscopy of monolayer MoS2

Nardeep Kumar, Sina Najmaei, Qiannan Cui, Frank Ceballos, Pulickel M. Ajayan, Jun Lou, Hui Zhao

摘要:

我们发现,单层二硫化钼的反转对称性的缺乏允许强的光学二次谐波产生。在机械剥离的单层中产生810 nm脉冲的二次谐波,其非线性极化率为1 E-7 m/V。在三层中,极化率降低了7倍,在均匀层中降低了约两个数量级。通过化学气相沉积法生长的样品上进行了原理验证的二次谐波显微镜测量,其示出了这种效应在快速和非侵入性检测的晶体取向,厚度均匀性,层堆叠,和单结晶域尺寸的原子薄膜的二硫化钼和类似材料的潜在应用。

英文摘要:

We show that the lack of inversion symmetry in monolayer MoS2 allows strong optical second harmonic generation. Second harmonic of an 810-nm pulse is generated in a mechanically exfoliated monolayer, with a nonlinear susceptibility on the order of 1E-7 m/V. The susceptibility reduces by a factor of seven in trilayers, and by about two orders of magnitude in even layers. A proof-of-principle second harmonic microscopy measurement is performed on samples grown by chemical vapor deposition, which illustrates potential applications of this effect in fast and non-invasive detection of crystalline orientation, thickness uniformity, layer stacking, and single-crystal domain size of atomically thin films of MoS2 and similar materials.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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