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arXiv 1301.4138cond-mat.mtrl-scicond-mat.mes-hall
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(In,Ga)N/GaN外延层应变和组分变化的空间分辨研究

Spatially resolved investigation of strain and composition variations in (In,Ga)N/GaN epilayers

Benjamin Wilsch, Uwe Jahn, Bernd Jenichen, Jonas Lähnemann, Holger T. Grahn

摘要:

通过空间积分X射线衍射和阴极发光(CL)光谱以及空间分辨CL和能量色散X射线分析,研究了在GAN模板上通过金属有机化学气相沉积生长的400 nm厚(In,Ga)N层的应变状态和成分. CL研究证实了应变弛豫过程,并伴随着(In,Ga)N层表面铟含量的增加,这被称为成分拉动效应。此外,我们确定的应变底部,无应变的顶部,和逐渐放松的中间区域的(In,Ga)N层。除了沿生长方向的铟含量的增加,应变弛豫导致朝向表面的铟分布的横向变化的增强。

英文摘要:

The strain state and composition of a 400 nm thick (In,Ga)N layer grown by metal-organic chemical vapor deposition on a GaN template are investigated by spatially integrated x-ray diffraction and cathodoluminescence (CL) spectroscopy as well as by spatially resolved CL and energy dispersive x-ray analysis. The CL investigations confirm a process of strain relaxation accompanied by an increasing indium content toward the surface of the (In,Ga)N layer, which is known as the compositional pulling effect. Moreover, we identify the strained bottom, unstrained top, and gradually relaxed intermediate region of the (In,Ga)N layer. In addition to an increase of the indium content along the growth direction, the strain relaxation leads to an enhancement of the lateral variations of the indium distribution toward the surface.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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