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arXiv 1206.3091cond-mat.mes-hall
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Bi2Se3拓扑绝缘体纳米带的受控MOCVD生长

Controlled MOCVD growth of Bi2Se3 topological insulator nanoribbons

L. D. Alegria, J. R. Petta

摘要:

拓扑绝缘体是一类支持拓扑保护电子表面态的新材料。表面态在低耗散电子器件中的潜在应用促使人们努力创造具有大的表面体积比和高度控制的化学计量的纳米尺度样品。在Bi 2Se 3中的Se空位引起体导电,这掩盖了表面态的输运性质。因此,我们开发了一种新的路线,用于合成拓扑绝缘体纳米结构,使用金属有机化学气相沉积(MOCVD)。MOCVD允许在生长期间控制Se/Bi通量比。与合理的增长的目的,我们改变的Se/Bi流量比,生长时间,和衬底温度,并观察形态的变化,这表明在其中nanoriginates形成是有限的Bi前体质量流的生长制度。Bi 2Se 3纳米结构的MOCVD生长通过不同的生长机制发生,该生长机制由纳米线基部的金纳米颗粒成核。通过调节反应条件,我们得到了长达10微米的单晶带或薄的微米级片晶。

英文摘要:

Topological insulators are a new class of materials that support topologically protected electronic surface states. Potential applications of the surface states in low dissipation electronic devices have motivated efforts to create nanoscale samples with large surface-to-volume ratios and highly controlled stoichiometry. Se vacancies in Bi2Se3 give rise to bulk conduction, which masks the transport properties of the surface states. We have therefore developed a new route for the synthesis of topological insulator nanostructures using metalorganic chemical vapour deposition (MOCVD). MOCVD allows for control of the Se/Bi flux ratio during growth. With the aim of rational growth, we vary the Se/Bi flux ratio, growth time, and substrate temperature, and observe morphological changes which indicate a growth regime in which nanoribbon formation is limited by the Bi precursor mass-flow. MOCVD growth of Bi2Se3 nanostructures occurs via a distinct growth mechanism that is nucleated by gold nanoparticles at the base of the nanowire. By tuning the reaction conditions, we obtain either single-crystalline ribbons up to 10 microns long or thin micron-sized platelets.

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