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arXiv 1111.6455cond-mat.mtrl-sci
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氢在硅中的扩散--氢在硅中动力学性质的从头算研究

Hydrogen Diffusion in Silicon - An ab initio Study of Hydrogen Kinetic Properties in Silicon

Liviu Bilteanu, Mathias Posselt, Jean-Paul Crocombette

摘要:

本文采用密度泛函理论计算了硅中氢缺陷的迁移和分解势垒等动力学性质。我们研究了以下缺陷:H原子(H)和离子(H+,H-),氢分子(H2)和氢络合物(H2*)。结果表明,主要的迁移物种是H离子,其电荷无关的迁移势垒为0.46 eV,与实验值[1]非常吻合。在较高的温度下,H2和H2* 分别以1.2和1.5 eV的势垒分解,而H2的迁移势垒为2.2 eV。因此,我们表明,与先前实验暗示的相反[2,3],在硅中,氢分子不参与通过扩散的氢传输。1. A. Van Wieringen和N. Warmoltz,Physica 22,849(1956). 2. S.拉奥,S。K. Dianjin,G. Lupke,N. H. Tolk和L. C. Feldman,Physical Review B 75,6(2007). 3. N. Escherichiata,A. Kasuya和M. Suezawa,Physica B 308,1125(2001).

英文摘要:

In this paper we present kinetic properties such as migration and decomposition barriers of hydrogen defects in silicon calculated by Density Functional Theory (DFT) based methods. We study the following defects: H atoms (H) and ions (H+, H-), hydrogen molecules (H2) and hydrogen complexes (H2*). Our results show that the dominating migration species are H ions, their charge-independent migration barrier being 0.46 eV in excellent agreement with experimental value [1]. At higher temperatures H2 and H2* decompose with barriers of 1.2 and 1.5 eV respectively, while the migration barrier of H2 is 2.2 eV. Hence, we show that, contrary to what has been experimentally implied [2, 3] previously, in silicon, hydrogen molecules do not participate to the hydrogen transport through diffusion. 1. A. Van Wieringen and N. Warmoltz, Physica 22, 849 (1956). 2. S. Rao, S. K. Dixit, G. Lupke, N. H. Tolk, and L. C. Feldman, Physical Review B 75, 6 (2007). 3. N. Fukata, A. Kasuya, and M. Suezawa, Physica B 308, 1125 (2001).

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