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arXiv 1104.0978cond-mat.mtrl-scicond-mat.mes-hall
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Bi_xBi_(111)薄膜中稳定非平凡Z2拓扑的第一性原理研究

Stable nontrivial Z2 topology in ultrathin Bi (111) films: a first-principles study

Zheng Liu, Chao-Xing Liu, Yong-Shi Wu, Wen-Hui Duan, Feng Liu, Jian Wu

摘要:

近年来,人们一直在努力寻找新的拓扑绝缘体(TI)材料。基于第一性原理计算,我们发现所有的Bi(111)薄膜都具有与薄膜厚度无关的非平凡Z ~ 2数,而不存在通常所认为的拓扑平凡性的奇偶振荡.稳定的非平凡的Z2拓扑结构被保留的并发带隙反转在多个时间反演不变的k点和相关的中间层间耦合的多双层Bi膜。我们的计算进一步表明,在厚Bi(111)膜中的金属表面态的存在可以有效地通过表面吸附去除。

英文摘要:

Recently, there have been intense efforts in searching for new topological insulator (TI) materials. Based on first-principles calculations, we find that all the ultrathin Bi (111) films are characterized by a nontrivial Z2 number independent of the film thickness, without the odd-even oscillation of topological triviality as commonly perceived. The stable nontrivial Z2 topology is retained by the concurrent band gap inversions at multiple time-reversal-invariant k-points and associated with the intermediate inter-bilayer coupling of the multi-bilayer Bi film. Our calculations further indicate that the presence of metallic surface states in thick Bi(111) films can be effectively removed by surface adsorption.

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