arXivDaily arXiv每日学术速递 周一至周五更新
北美退伍军人节(Veterans Day),12 日无更新
arXiv 0906.2146cond-mat.mtrl-scicond-mat.other
收藏

Si/SiO2界面附近的自旋极化电子输运

Spin polarized electron transport near the Si/SiO2 interface

Hyuk-Jae Jang, Ian Appelbaum

摘要:

利用长距离横向器件,在60K下,通过面内磁场中的自旋阀测量和垂直磁场中的自旋进动测量,研究了Si及其自然氧化物(SiO2)界面附近的自旋输运.由于电子被静电门吸引到界面,我们观察到较短的平均自旋渡越时间和自旋相干性的增加,尽管总自旋极化减少。这种行为,这是在体传输设备中看到的预期的指数去极化相反,解释使用变换方法来恢复经验的自旋渡越时间分布和一个简单的两阶段漂移扩散模型。我们确定强界面诱导的自旋去极化(减少自旋寿命超过两个数量级,从它的散装运输值)作为这些现象的一致原因。

英文摘要:

Using long-distance lateral devices, spin transport near the interface of Si and its native oxide (SiO2) is studied by spin-valve measurements in an in-plane magnetic field and spin precession measurements in a perpendicular magnetic field at 60K. As electrons are attracted to the interface by an electrostatic gate, we observe shorter average spin transit times and an increase in spin coherence, despite a reduction in total spin polarization. This behavior, which is in contrast to the expected exponential depolarization seen in bulk transport devices, is explained using a transform method to recover the empirical spin transit-time distribution and a simple two-stage drift-diffusion model. We identify strong interface-induced spin depolarization (reducing the spin lifetime by over two orders of magnitude from its bulk transport value) as the consistent cause of these phenomena.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑