arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 0705.2993cond-mat.mtrl-scicond-mat.other
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室温自旋极化磁性半导体

Room temperature spin polarized magnetic semiconductor

Soack Dae Yoon, Carmine Vittoria, Vincent G. Harris, Allan Widom

摘要:

采用可控脉冲激光烧蚀沉积技术,在低氧室气压下,在(100)LaAlO($_3$)基片上制备了Fe和钛白($_{2-δ}$)交替层。膜的总厚度为约200 nm。薄膜在4 ~ $400 ^oK$温度范围内表现出铁磁行为。层状膜结构的特征在于在$300 ^oK$的p型磁性半导体,具有$10^{20} /cm^3$数量级的载流子密度。未掺杂的纯TiO $_{2-δ}$薄膜被表征为n型磁性半导体。空穴载流子在颗粒Fe和TiO $_{2-δ}$层之间的界面处被激发,类似于在金属氧化物半导体(MOS)器件中通常观察到的金属/n型半导体界面中被激发的空穴。在界面处的孔在施加的磁场中被极化,提高了这些颗粒MOS结构可用于实际自旋电子器件应用的可能性。

英文摘要:

Alternating layers of granular Iron (Fe) and Titanium dioxide (TiO$_{2-δ}$) were deposited on (100) Lanthanum aluminate (LaAlO$_3$) substrates in low oxygen chamber pressure using a controlled pulsed laser ablation deposition technique. The total thickness of the film was about 200 nm. The films show ferromagnetic behavior for temperatures ranging from 4 to $400 ^oK$. The layered film structure was characterized as p-type magnetic semiconductor at $300 ^oK$ with a carrier density of the order of $10^{20} /cm^3$. The undoped pure TiO$_{2-δ}$ film was characterized as an n-type magnetic semiconductor. The hole carriers were excited at the interface between the granular Fe and TiO$_{2-δ}$ layers similar to holes excited in the metal/n-type semiconductor interface commonly observed in Metal-Oxide-Semiconductor (MOS) devices. The holes at the interface were polarized in an applied magnetic field raising the possibility that these granular MOS structures can be utilized for practical spintronic device applications.

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