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arXiv 2312.05967physics.opticsphysics.app-ph
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利用原子层沉积优化 InP 纳米梁腔的品质因子

Optimizing the quality factor of InP nanobeam cavities using atomic layer deposition

Mohammad Habibur Rahaman, Chang-Min Lee, Mustafa Atabey Buyukkaya, Samuel Harper, Fariba Islam, Edo Waks

AI总结:

本文提出利用 Al$_2$O$_3$ 原子层沉积钝化 InP 纳米梁腔表面,将品质因子最高提升 140%,并可通过沉积厚度无损调谐谐振波长。

摘要:

光子晶体纳米梁腔因其小模式体积、CMOS 兼容性和高耦合效率而受到重视,这些特性对于各类低功耗光子应用和量子信息处理至关重要。然而,尽管纳米梁腔具有潜力,但由于制造缺陷会产生表面态和光吸收,其品质因子往往较低。在本研究中,我们通过原子层沉积施加 Al$_2$O$_3$ 涂层,以终止悬键并降低表面吸收,展示了品质因子最高提升 140% 的 InP 纳米梁腔。此外,改变沉积厚度可以在不损害品质因子的情况下精确调谐腔模波长。这种 Al$_2$O$_3$ 原子层沉积方法在优化纳米梁腔方面具有广阔前景,这些腔非常适合与广泛的光子应用集成。

英文摘要:

Photonic crystal nanobeam cavities are valued for their small mode volume, CMOS compatibility, and high coupling efficiency crucial features for various low-power photonic applications and quantum information processing. However, despite their potential, nanobeam cavities often suffer from low quality factors due to fabrication imperfections that create surface states and optical absorption. In this work, we demonstrate InP nanobeam cavities with up to 140% higher quality factors by applying a coating of Al$_2$O$_3$ via atomic layer deposition to terminate dangling bonds and reduce surface absorption. Additionally, changing the deposition thickness allows precise tuning of the cavity mode wavelength without compromising the quality factor. This Al$_2$O$_3$ atomic layer deposition approach holds great promise for optimizing nanobeam cavities that are well-suited for integration with a wide range of photonic applications.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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