arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2209.00558cond-mat.mtrl-scicond-mat.mes-hallcond-mat.str-el
收藏

高频应用Bi0.1Y2.9Fe5O 12薄膜的生长参数

Growth parameters of Bi0.1Y2.9Fe5O12 thin films for high frequency applications

Ganesh Gurjar, Vinay Sharma, Satyabrata Patnaik, Bijoy K. Kuanr

摘要:

本文报道了Bi掺杂YIG(Bi-YIG,Bi_(0.1)Y_(2.9)Fe_5 O_(12))薄膜的生长和表征。在钆镓石榴石衬底上生长了厚度为20 ~ 150 nm的脉冲激光沉积(PLD)薄膜。考虑了(100)和(111)两种衬底取向。Bi ~(3+)离子在(111)面十二面体晶位上的分布增强,使薄膜的晶格常数从(100)面的12.379埃增加到(111)面的12.415埃。原子力显微镜图像显示,随着薄膜厚度的增加,粗糙度降低。与(100)取向薄膜相比,(111)取向薄膜的铁磁共振线宽增大,吉尔伯特阻尼增大。对于厚度为150 nm的(100)和(111)取向薄膜,最低吉尔伯特阻尼值分别为(1.06)× 10 ~(-4)和(2.30)× 10 ~(-4)。观测到的非本征线宽、有效磁化强度和各向异性场的值与薄膜的厚度和衬底取向有关。此外,与(111)沉积膜的情况不同,面内角度变化为(100)沉积膜建立了四重对称性。本研究规定的PLD生长单晶Bi-YIG薄膜的生长条件,对所需的高频和磁光器件的应用。

英文摘要:

The growth and characterization of Bismuth (Bi) substituted YIG (Bi-YIG, Bi0.1Y2.9Fe5O12) thin films are reported. Pulsed laser deposited (PLD) films with thicknesses ranging from 20 to 150 nm were grown on Gadolinium Gallium Garnet substrates. Two substrate orientations of (100) and (111) were considered. The enhanced distribution of Bi3+ ions at dodecahedral site along (111) is observed to lead to an increment in lattice constant from 12.379 angstrom in (100) to 12.415 angstrom in (111) oriented films. Atomic force microscopy images showed decreasing roughness with increasing film thickness. Compared to (100) grown films, (111) oriented films showed an increase in ferromagnetic resonance linewidth and consequent increase in Gilbert damping. The lowest Gilbert damping values are found to be (1.06) * 10E-4 for (100) and (2.30) * 10E-4 for (111) oriented films with thickness of 150 nm. The observed values of extrinsic linewidth, effective magnetization, and anisotropic field are related to thickness of the films and substrate orientation. In addition, the in-plane angular variation established four-fold symmetry for the (100) deposited films unlike the case of (111) deposited films. This study prescribes growth conditions for PLD grown single-crystalline Bi-YIG films towards desired high frequency and magneto-optical device applications.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑