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arXiv 1606.01211cond-mat.mtrl-scicond-mat.mes-hall
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超薄缺氧SrTiO $_3$薄膜的金属性

Metallicity in Ultra-Thin Oxygen-Deficient SrTiO$_3$ Thin Films

Purnima P. Balakrishnan, Urusa S. Alaan, Matthew T. Gray, Yuri Suzuki

摘要:

我们报道了在(001)SrTiO $_3$或DyScO $_3$缓冲的(001)SrTiO $_3$衬底上相干应变时,在缺氧SrTiO $_3$的薄膜中观察到的金属行为。这些膜在2 K下具有高达2 $\times10^{22}$ cm $^{-3}$的载流子浓度和高达19,000 cm $^2$ /V·s的迁移率。在我们的SrTiO $_{3-δ}$薄膜中存在非导电层,该非导电层在具有较低载流子浓度的薄膜中较大。该非导电层可以归因于由于费米能级钉扎电势而引起的表面耗尽层。在SrTiO $_3$和$_3$薄膜之间插入DyScO $_3$缓冲层对薄膜的耗尽宽度、输运和结构特性没有很大影响。

英文摘要:

We report on the observation of metallic behavior in thin films of oxygen-deficient SrTiO$_3$ - down to 9 unit cells - when coherently strained on (001) SrTiO$_3$ or DyScO$_3$-buffered (001) SrTiO$_3$ substrates. These films have carrier concentrations of up to 2$\times10^{22}$ cm$^{-3}$ and mobilities of up to 19,000 cm$^2$/V-s at 2 K. There exists a non-conducting layer in our SrTiO$_{3-δ}$ films that is larger in films with lower carrier concentrations. This non-conducting layer can be attributed to a surface depletion layer due to a Fermi level pinning potential. The depletion width, transport, and structural properties are not greatly affected by the insertion of a DyScO$_3$ buffer between the SrTiO$_3$ film and SrTiO$_3$ substrate.

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