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arXiv 0906.0433cond-mat.mes-hallcond-mat.mtrl-sci
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脉冲laser沉积E- Fe_{1-x} Co_xSi薄膜的结构和磁性

Structural and magnetic properties of E-Fe_{1-x}Co_xSi thin films deposited via pulsed laser deposition

Ncholu Manyala, Balla D. Ngom, A. C. Beye, Remy Bucher, Malik Maaza, Andre Strydom, Andrew Forbes, A. T. Charlie Johnson, J. F. DiTusa

摘要:

本文报道了在Si(111)衬底上脉冲激光沉积制备多晶Fe_(1-x)Cox-Si薄膜的方法及其表征。X射线衍射,透射电子显微镜和原子力显微镜显示膜是致密的,非常光滑的,并且具有立方B20晶体结构的单相。铁磁性与显着的磁滞被发现为所有的薄膜,包括名义上纯FeSi薄膜在体FeSi的顺磁性非常弱的对比。对于Fe 1-xCoxSi,这意味着从体的螺旋磁性到薄膜的铁磁性的变化。这些铁磁薄膜是有前途的磁硅化物/硅系统的极化电流的生产,操纵和检测。

英文摘要:

We report pulsed laser deposition synthesis and characterization of polycrystalline Fe1-xCox Si thin films on Si (111). X-ray diffraction, transmission electron, and atomic force microscopies reveal films to be dense, very smooth, and single phase with a cubic B20 crystal structure. Ferromagnetism with significant magnetic hysteresis is found for all films including nominally pure FeSi films in contrast to the very weak paramagnetism of bulk FeSi. For Fe1-xCoxSi this signifies a change from helimagnetism in bulk, to ferromagnetism in thin films. These ferromagnetic thin films are promising as a magnetic-silicide/silicon system for polarized current production, manipulation, and detection.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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