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arXiv 2203.09368cond-mat.mes-hallphysics.optics
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近场热流整流的基本极限:本征半导体薄膜的势

Fundamental limit to the rectification of near-field heat flow: The potential of intrinsic semiconductor films

Qizhang Li, Qun Chen, Bai Song

摘要:

在波动电动力学的框架内,我们推导了本征半导体薄膜介导的近场辐射热整流的基本极限。通过利用电磁局域态密度,我们确定了ε"_H/ε"_L作为整流幅度的上限,其中ε"_H和ε"_L分别是高温和低温下薄膜介电常数的虚部。该界限很紧,无论薄膜是否悬挂或支撑,都可以接近。对于本征硅,极限原则上可以超过10^9。我们的工作突出了控制热流作为有效的电流的可能性,并提供了潜在的实现这一目标的指导方针。

英文摘要:

We derive the fundamental limit to near-field radiative thermal rectification mediated by an intrinsic semiconductor film within the framework of fluctuational electrodynamics. By leveraging the electromagnetic local density of states, we identify ε"_H/ε"_L as an upper bound on the rectification magnitude, where ε"_H and ε"_L are respectively the imaginary parts of the film permittivity at high and low temperatures. This bound is tight and can be approached regardless of whether the film is suspended or supported. For intrinsic silicon the limit can in principle exceed 10^9. Our work highlights the possibility of controlling heat flow as effectively as electric current, and offers guidelines to potentially achieve this goal.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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