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arXiv 2202.04149cond-mat.mtrl-sciquant-ph
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硅中T心的第一性原理研究

First principles study of the T-center in Silicon

Diana Dhaliah, Yihuang Xiong, Alp Sipahigil, Sinéad M. Griffin, Geoffroy Hautier

摘要:

硅中的T中心是一种众所周知的碳基色心,最近被考虑用于量子技术应用。使用第一性原理计算,我们表明,激发态是由一个缺陷束缚激子由一个局域的缺陷态占据的电子,其中一个空穴是绑定。定域态具有很强的碳\textit{p}特征,并使人联想到乙基自由基分子中未成对电子的定域。计算得到缺陷束缚激子的辐射寿命为$μ$ s量级,比金刚石中的NV中心等量子缺陷长得多,与实验结果一致.较长的寿命与小的跃迁偶极矩,作为一个结果的非常不同的性质的本地化和离域状态形成的缺陷束缚激子。最后,我们使用第一性原理计算来评估T中心的稳定性。我们发现T-中心是稳定的,对分解成更简单的缺陷时,保持固定的化学计量。然而,我们发现T中心很容易发生氢化(脱氢化),因此需要非常精确的退火条件(温度和气氛)才能有效地形成。

英文摘要:

The T-center in silicon is a well-known carbon-based color center that has been recently considered for quantum technology applications. Using first principles computations, we show that the excited state is formed by a defect-bound exciton made of a localized defect state occupied by an electron to which a hole is bound. The localized state is of strong carbon \textit{p} character and reminiscent of the localization of the unpaired electron in the ethyl radical molecule. The radiative lifetime for the defect-bound exciton is calculated to be on the order of $μ$s, much longer than other quantum defects such as the NV center in diamond and in agreement with experiments. The longer lifetime is associated with the small transition dipole moment as a result of the very different nature of the localized and delocalized states forming the defect-bound exciton. Finally, we use first principles calculations to assess the stability of the T-center. We find the T-center to be stable against decomposition into simpler defects when keeping the stoichiometry fixed. However, we identify that the T-center is easily prone to (de)hydrogenation and so requires very precise annealing conditions (temperature and atmosphere) to be efficiently formed.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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