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arXiv 1308.5083cond-mat.mes-hallcond-mat.mtrl-sci
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偶极硼中心对纳米硅p ~+-n结电致发光的影响

The Effect of Dipole Boron Centers on the Electroluminescence of Nanoscale Silicon p+-n Junctions

Nikolay Bagraev, Leonid Klyachkin, Roman Kuzmin, Anna Malyarenko, Vladimir Mashkov

摘要:

纳米级硅p(+)-n结具有非常高的硼浓度,5 10^21 cm-3,被发现表现出有趣的光学性质。近红外电致发光(EL)光谱中主要的发射带具有沿择优晶轴方向的高度线性偏振,这种线性偏振可以通过施加在p(+)-n结平面上的横向电压来控制。这种行为与EL强度的温度依赖性一起归因于自补偿偶极硼中心B(+)-B(-)的存在,其具有负相关能,这是使用ESR技术在重掺杂硼的纳米级硅p(+)-n结中识别的。提出了通过负U偶极硼中心控制纳米硅p(+)-n结光学性质的复合过程模型。

英文摘要:

Nanoscale silicon p(+)-n junctions with very high concentration of boron, 5 10^21 cm-3, are found to demonstrate interesting optical properties. Emission band dominated in near-infrared electroluminescence (EL) spectra possesses high degree of the linear polarization along preferred crystallographic axis which can be controlled by the lateral voltage applied in the plane of the p(+)-n junction. Such behavior together with the temperature dependence of the EL intensity is attributed to the presence of the self-compensating dipole boron centers, B(+)-B(-), with negative correlation energy which are identified using the ESR technique in the nanoscale silicon p(+)-n junctions heavily doped with boron. The model of the recombination process though the negative-U dipole boron centers controlling the optical properties of the nanoscale silicon p(+)-n junctions is proposed.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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