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arXiv 2201.03493cond-mat.mes-hall
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基于PdSe₂的场效应晶体管

PdSe2 based field-effect transistors

Keshari Nandan, Amit Agarwal, Somnath Bhowmick, Yogesh S. Chauhan

AI总结:

本研究采用结合密度泛函理论与量子输运的多尺度模拟框架,探究单层PdSe₂基p型FET的性能,发现其开关特性优异,沟道可缩至7 nm,4 nm沟长的亚阈值摆幅退化可通过欠叠结构缓解。

摘要:

五角形PdSe₂因具备高空气稳定性和各向异性输运特性,是层状电子器件的极具潜力的候选材料。本文采用结合密度泛函理论与量子输运的多尺度模拟框架,对基于单层PdSe₂的p型场效应晶体管(FET)性能展开研究。研究发现,当源漏方向沿[010]和[100]晶向排列时,单层PdSe₂器件均展现出优异的开关特性(亚阈值摆幅<65 mV/decade);两个晶向均具备良好的导通态电流和大跨导,其中沟道长度为15 nm的器件沿[010]晶向的上述参数更优。对这类p型FET的沟道长度缩放研究表明,沟道长度可轻松缩小至7 nm,且性能无显著下降。当沟道长度低于7 nm时,4 nm沟长器件的亚阈值摆幅会出现严重退化;不过通过引入欠叠结构可将这种退化降至最低,欠叠长度需根据导通态电流与开关性能之间的权衡来确定。

英文摘要:

Pentagonal PdSe2 is a promising candidate for layered electronic devices, owing to its high air-stability and anisotropic transport properties. Here, we investigate the performance of p-type FET based on PdSe$_2$ mono-layer using multi-scale simulation framework combining Density functional theory and quantum transport. We find that mono-layer PdSe$_2$ devices show excellent switching characteristics ($<$ 65 mV/decade) for the source-drain direction aligned along both [010] and [100] directions. Both directions also show good on-state current and large transconductance, though these are larger along the [010] direction for a 15 nm channel device. The channel length scaling study of these p-FETs indicates that channel length can be easily scaled down to 7 nm without any significance compromise in the performance. Going below 7 nm, we find that there is a severe degradation in the sub-threshold swing for 4 nm channel length. However, this degradation can be minimized by introducing an underlap structure. The length of underlap is determined by the trade-off between on-state current and the switching performance.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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