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arXiv 2103.11980math.AG
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混合特征下的增广基轨迹

The Augmented Base Locus in Mixed Characteristic

Liam Stigant

摘要:

设$L$是方案$X$上的一个nef和big线丛。众所周知,如果$X$是域上的射影,则增广基轨迹和例外基轨迹一致。将这一结果推广到任意优良Noether基上的射影概形,并假设其特征值为零.特别地,当基是混合特征戴德金整环或$L$在特征$0$上是半样本时,该结果成立.

英文摘要:

Let $L$ be a nef and big line bundle on a scheme $X$. It is well known that if $X$ is a projective over a field then the augmented base locus and the exceptional base locus agree. This result is extended to projective schemes over arbitrary excellent Noetherian bases, assuming the result holds in characteristic zero. In particular the result holds if the base is a mixed characteristic Dedekind domain or if $L$ is semiample in characteristic $0$.

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