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arXiv 2102.07153cond-mat.mes-hallcond-mat.mtrl-sci
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高介电常数薄膜中的门控电子相互作用

Gate-tunable electron interaction in high-κ dielectric films

Svitlana Kondovych, Igor Luk'yanchuk, Tatyana I. Baturina, Valerii M. Vinokur

摘要:

电荷间库仑相互作用的二维对数特性和由此产生的对数约束是高介电常数(high- $κ$)薄膜的显著固有特性,具有深远的意义。最重要的是,这是具有显著表现形式的电荷Berezinskiii-Kosterlitz-无电荷跃迁,低温超绝缘拓扑相。在这里,我们表明,限制的范围可以通过外部栅电极和解开各种静电相互作用的高$κ$膜。我们发现,通过减少从栅极到膜的距离,我们减少了2D长程对数相互作用的空间范围,将其改变为主要偶极或甚至指数在横向距离超过膜栅分离的尺寸。我们的研究结果提供了一个独特的实验室,深入研究拓扑相变和相关现象,从量子金属和超导体-绝缘体过渡的临界性到存储器纳米器件中的电荷捕获和库仑可扩展性的影响。

英文摘要:

The two-dimensional (2D) logarithmic character of Coulomb interaction between charges and the resulting logarithmic confinement is a remarkable inherent property of high dielectric constant (high-$κ$) thin films with far reaching implications. Most and foremost, this is the charge Berezinskii-Kosterlitz-Thouless transition with the notable manifestation, low-temperature superinsulating topological phase. Here we show that the range of the confinement can be tuned by the external gate electrode and unravel a variety of electrostatic interactions in high-$κ$ films. We find that by reducing the distance from the gate to the film, we decrease the spatial range of the 2D long-range logarithmic interaction, changing it to predominantly dipolar or even to exponential one at lateral distances exceeding the dimension of the film-gate separation. Our findings offer a unique laboratory for the in-depth study of topological phase transitions and related phenomena that range from criticality of quantum metal- and superconductor-insulator transitions to the effects of charge-trapping and Coulomb scalability in memory nanodevices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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