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arXiv 0901.2901cond-mat.mes-hallcond-mat.mtrl-sci
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用Al2O3介质实现高迁移率双栅石墨烯场效应晶体管

Realization of a High Mobility Dual-gated Graphene Field Effect Transistor with Al2O3 Dielectric

Seyoung Kim, Junghyo Nah, Insun Jo, Davood Shahrjerdi, Luigi Colombo, Zhen Yao, Emanuel Tutuc, Sanjay K. Banerjee

摘要:

我们制作和表征双栅石墨烯场效应晶体管(FET)使用氧化铝作为顶栅电介质。我们使用薄Al膜作为成核层,以使Al 2 O3的原子层沉积。我们的器件在室温下显示出超过8,000 cm 2/Vs的迁移率值,这一发现表明顶栅叠层不会显著增加载流子散射,从而降低器件特性。我们提出了一个设备模型,以适应使用一个单一的流动性值的实验数据。

英文摘要:

We fabricate and characterize dual-gated graphene field-effect transistors (FETs) using Al2O3 as top-gate dielectric. We use a thin Al film as a nucleation layer to enable the atomic layer deposition of Al2O3. Our devices show mobility values of over 8,000 cm2/Vs at room temperature, a finding which indicates that the top-gate stack does not significantly increase the carrier scattering, and consequently degrade the device characteristics. We propose a device model to fit the experimental data using a single mobility value.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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