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arXiv 1507.08412cond-mat.mes-hallcond-mat.mtrl-sci
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基于实验数据的栅极可调金属-石墨烯接触电阻的物理模型

A physics based model of gate tunable metal-graphene contact resistance benchmarked against experimental data

Ferney A. Chaves, David Jiménez, Abhay A. Sagade, Wonjae Kim, Juha Riikonen, Harri Lipsanen, Daniel Neumaier

摘要:

金属-石墨烯接触电阻是实现可行的基于石墨烯的电子器件的技术瓶颈。我们报告了一个有用的模型,以找到该电阻的栅极可调组件,该电阻由下面的3D金属和2D石墨烯之间的载流子的顺序隧穿确定,然后由Klein隧穿到沟道中的石墨烯。该模型量化了控制电阻的内在因素,包括非故意化学掺杂的影响。我们的结果与几种金属的实验结果一致。

英文摘要:

The metal-graphene contact resistance is a technological bottleneck for the realization of viable graphene based electronics. We report a useful model to find the gate tunable components of this resistance determined by the sequential tunneling of carriers between the 3D-metal and 2D-graphene underneath followed by Klein tunneling to the graphene in the channel. This model quantifies the intrinsic factors that control that resistance, including the effect of unintended chemical doping. Our results agree with experimental results for several metals.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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