arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2402.00461cond-mat.mes-hall
收藏

Bernal堆叠三层石墨烯中的电场可调边缘输运

Electric field tunable edge transport in Bernal stacked trilayer graphene

Saurabh Kumar Srivastav, Adithi Udupa, K. Watanabe, T. Taniguchi, Diptiman Sen, Anindya Das

AI总结:

本研究通过实验与理论结合,证实Bernal堆叠三层石墨烯在足够位移场下存在边缘介导的电荷输运,揭示了非局域电阻的标度规律与温度、沟道长度的依赖关系。

摘要:

本快报针对六方氮化硼(hBN)封装的双栅Bernal堆叠(ABA)三层石墨烯,在不同位移场($D$)和温度($T$)条件下开展了电场可调边缘输运的非局域研究。测量结果显示,非局域电阻($R_{NL}$)超出经典欧姆贡献预期至少两个数量级。通过标度分析发现,仅当$D$超过约0.2 V/nm的临界值时,非局域电阻才与局域电阻($R_{L}$)呈线性标度关系。此外,在温度低于体带隙能量阈值($T<25$ K)时,标度指数保持为常数1。进一步研究发现,$R_{NL}$的数值随沟道长度($L$)的增加呈线性下降趋势。这些实验发现为有限位移场作用下ABA三层石墨烯中由边缘介导的电荷输运提供了证据。此外,我们的理论计算也支持上述结果,证明当施加足够大的位移场时,体带隙能量范围内会出现色散边缘模式。

英文摘要:

This letter presents a non-local study on the electric field tunable edge transport in an hBN-encapsulated dual-gated Bernal stacked (ABA) trilayer graphene across various displacement fields ($D$) and temperatures ($T$). Our measurements revealed that the non-local resistance ($R_{NL}$) surpassed the expected classical ohmic contribution by a factor of at least two orders of magnitude. Through scaling analysis, we found that the non-local resistance scales linearly with the local resistance ($R_{L}$) only when the $D$ exceeds a critical value of $\sim0.2$ V/nm. Additionally, we observed that the scaling exponent remains constant at unity for temperatures below the bulk-band gap energy threshold ($T<25$ K). Further, the value of $R_{NL}$ decreases in a linear fashion as the channel length ($L$) increases. These experimental findings provide evidence for edge-mediated charge transport in ABA trilayer graphene under the influence of a finite displacement field. Furthermore, our theoretical calculations support these results by demonstrating the emergence of dispersive edge modes within the bulk-band gap energy range when a sufficient displacement field is applied.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑