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arXiv 2010.09883cond-mat.mes-hall
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侵入式金属探针对半导体纳米结构中霍尔测量的影响

Impact of invasive metal probes on Hall measurements in semiconductor nanostructures

J. G. Gluschke, J. Seidl, H. H. Tan, C. Jagadish, P. Caroff, A. P. Micolich

摘要:

自下而上生长的最新进展正在产生一系列新的二维纳米结构。霍尔效应测量在它们的电学特性中起着重要的作用。然而,尺寸限制可能导致器件几何形状显著偏离具有无电流触点的细长霍尔条的理想形状。使用这些新材料的许多器件具有低纵横比,并具有与半导体沟道重叠的金属霍尔探针。这可能导致电流的显著失真。我们目前的实验数据从InAs二维纳米鳍器件与不同的霍尔探针的几何形状,研究霍尔探针的长度和宽度的影响。我们使用有限元模拟来进一步了解这些方面的影响,并将范围扩大到接触电阻和样本纵横比。我们的关键发现是,侵入式探头导致测量的霍尔电压显著低估,通常为40- 80%。这反过来又导致随后成比例地高估载流子浓度和低估迁移率

英文摘要:

Recent advances in bottom-up growth are giving rise to a range of new two-dimensional nanostructures. Hall effect measurements play an important role in their electrical characterization. However, size constraints can lead to device geometries that deviate significantly from the ideal of elongated Hall bars with currentless contacts. Many devices using these new materials have a low aspect ratio and feature metal Hall probes that overlap with the semiconductor channel. This can lead to a significant distortion of the current flow. We present experimental data from InAs 2D nanofin devices with different Hall probe geometries to study the influence of Hall probe length and width. We use finite-element simulations to further understand the implications of these aspects and expand the scope to contact resistance and sample aspect ratios. Our key finding is that invasive probes lead to a significant underestimation in the measured Hall voltage, typically of the order of 40-80%. This in turn leads to a subsequent proportional overestimation of carrier concentration and an underestimation of mobility

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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