arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2008.01703physics.acc-ph
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用结构光场表征超低发射度电子束

Characterizing ultra-low emittance electron beams using structured light fields

Andreas Seidel, Jens Osterhoff und Matt Zepf

摘要:

近年来,产生超低发射度电子束的新方案得到了发展,并有望为未来的高能物理实验和自由电子激光提供具有优良束流质量的紧凑粒子源。目前用于表征低发射度电子束的方法,例如胡椒壶测量或束聚焦扫描,在其分辨亚$0.1$ mm mrad范围内的发射度的能力方面受到限制。在这里,我们提出了一种新的,高灵敏度的Single Shot的束腰和发射度的特征使用干涉激光束的方法。在该方案中,两个激光脉冲在一定角度下聚焦,产生类似光栅的干涉图案。当电子束与结构化激光场相互作用时,电子束的相空间变得由激光有质动力调制,并且在进一步的电子束相位提前之后导致调制的束轮廓,这允许超低发射度束的表征。二维PIC模拟表明,该技术的有效性归一化发射度范围内的$ε_n=[0.01,1]$毫米mrad。

英文摘要:

Novel schemes for generating ultra-low emittance electron beams have been developed in the last years and promise compact particle sources with excellent beam quality suitable for future high-energy physics experiments and free-electron lasers. Current methods for the characterization of low emittance electron beams such as pepperpot measurements or beam focus scanning are limited in their capability to resolve emittances in the sub $0.1$ mm mrad regime. Here we propose a novel, highly sensitive method for the single shot characterization of the beam waist and emittance using interfering laser beams. In this scheme, two laser pulses are focused under an angle creating a grating-like interference pattern. When the electron beam interacts with the structured laser field, the phase space of the electron beam becomes modulated by the laser ponderomotive force and results in a modulated beam profile after further electron beam phase advance, which allows for the characterization of ultra-low emittance beams. 2D PIC simulations show the effectiveness of the technique for normalized emittances in the range of $ε_n=[0.01,1]$ mm mrad.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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