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arXiv 1410.8014physics.acc-ph
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电子束离子源

Electron Beam Ion Sources

G. Zschornacka, M. Schmidt, A. Thorn

摘要:

电子束离子源(EBIS)是基于电子碰撞电离原理工作的离子源,允许产生非常高电荷的离子。产生的离子可以作为DC离子束以及不同时间结构的离子脉冲提取。与大多数其它已知的离子源相比,EBIS的特征在于具有非常好的束流发射度和低能量扩散的离子束。此外,EBIS是来自高电荷离子的光子(X射线、紫外线、极紫外线、可见光)的极好来源。本章概述了EBIS的物理原理、工作原理和已知的技术解决方案。通过实例,讨论了EBIS的性能及其在基础研究、技术和医学等各个领域的应用。

英文摘要:

Electron beam ion sources (EBISs) are ion sources that work based on the principle of electron impact ionization, allowing the production of very highly charged ions. The ions produced can be extracted as a DC ion beam as well as ion pulses of different time structures. In comparison to most of the other known ion sources, EBISs feature ion beams with very good beam emittances and a low energy spread. Furthermore, EBISs are excellent sources of photons (X-rays, ultraviolet, extreme ultraviolet, visible light) from highly charged ions. This chapter gives an overview of EBIS physics, the principle of operation, and the known technical solutions. Using examples, the performance of EBISs as well as their applications in various fields of basic research, technology and medicine are discussed.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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