arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2006.04085cond-mat.mtrl-scicond-mat.mes-hall
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Multiscale simulation of the focused electron beam induced deposition process

Pablo de Vera, Martina Azzolini, Gennady Sushko, Isabel Abril, Rafael Garcia-Molina, Maurizio Dapor, Ilia A. Solov'yov, Andrey V. Solov'yov

英文摘要:

Focused electron beam induced deposition (FEBID) is a powerful technique for 3D-printing of complex nanodevices. However, for resolutions below 10 nm, it struggles to control size, morphology and composition of the structures, due to a lack of molecular-level understanding of the underlying irradiation-driven chemistry (IDC). Computational modelling is a tool to comprehend and further optimise FEBID-related technologies. Here we utilise a novel multiscale methodology which couples Monte Carlo simulations for radiation transport with irradiation-driven molecular dynamics for simulating IDC with atomistic resolution. Through an in depth analysis of W(CO)$_6$ deposition on SiO$_2$ and its subsequent irradiation with electrons, we provide a comprehensive description of the FEBID process and its intrinsic operation. Our analysis reveals that these simulations deliver unprecedented results in modelling the FEBID process, demonstrating an excellent agreement with available experimental data of the simulated nanomaterial composition, microstructure and growth rate as a function of the primary beam parameters.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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