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arXiv 2004.11301cond-mat.mtrl-sci
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缺陷工程诱导的SrRuO3单层厚膜拓扑霍尔效应

Topological Hall effect in single thick SrRuO3 layers induced by defect engineering

Changan Wang, Ching-Hao Chang, Andreas Herklotz, Chao Chen, Fabian Ganss, Ulrich Kentsch, Deyang Chen, Xingsen Gao, Yu-Jia Zeng, Olav Hellwig, Manfred Helm, Sib… 展开作者

Changan Wang, Ching-Hao Chang, Andreas Herklotz, Chao Chen, Fabian Ganss, Ulrich Kentsch, Deyang Chen, Xingsen Gao, Yu-Jia Zeng, Olav Hellwig, Manfred Helm, Sibylle Gemming, Ying-Hao Chu, Shengqiang Zhou

摘要:

在SrRuO_3(SRO)薄膜中发现了拓扑霍尔效应(THE),其中SRO层与另一氧化层之间的界面破坏了反转对称性,导致THE的出现。因此,THE仅发生在几个单元电池的超薄SRO膜中。除了采用异质结构之外,可以通过引入缺陷内在地破坏体SRO中的反转对称性。在这项研究中,观察到在60 nm厚的SRO膜,其中引入的缺陷和晶格畸变的氦离子辐照。辐照SRO膜在5 ~ 80 K的温度范围内表现出明显的热膨胀效应。这些观察结果可以归因于Dzyaloshinskiii-Moriya相互作用的出现,这是与晶格缺陷工程相关的人工反演对称性破缺的结果。氧化物单层中THE的产生和控制可以通过非原位膜处理来实现。因此,这项工作提供了新的见解的THE和说明了一个有前途的策略,设计新颖的自旋电子器件。

英文摘要:

The topological Hall effect (THE) has been discovered in ultrathin SrRuO3 (SRO) films, where the interface between the SRO layer and another oxide layer breaks the inversion symmetry resulting in the appearance of THE. Thus, THE only occurs in ultra-thin SRO films of several unit cells. In addition to employing a heterostructure, the inversion symmetry can be broken intrinsically in bulk SRO by introducing defects. In this study THE is observed in 60 nm thick SRO films, in which defects and lattice distortions are introduced by helium ion irradiation. The irradiated SRO films exhibit a pronounced THE in a wide temperature range from 5 K to 80 K. These observations can be attributed to the emergence of Dzyaloshinskii-Moriya interaction as a result of artificial inversion symmetry breaking associated to the lattice defect engineering. The creation and control of the THE in oxide single layers can be realized by ex situ film processing. Therefore, this work provides new insights into the THE and illustrates a promising strategy to design novel spintronics devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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