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arXiv 1709.08161cond-mat.mtrl-scicond-mat.mes-hall
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磁性拓扑绝缘体中的维交叉诱导拓扑霍尔效应

Dimensional Crossover Induced Topological Hall Effect in a Magnetic Topological Insulator

Chang Liu, Yunyi Zang, Wei Ruan, Yan Gong, Ke He, Xucun Ma, Qi-Kun Xue, Yayu Wang

摘要:

本文报道了分子束外延生长的Mn掺杂Bi_2Te_3拓扑绝缘体(TI)薄膜的输运性质。我们发现厚度超过5个五层(QL)的薄膜表现出通常的反常霍尔效应的磁性TI。然而,当厚度减小到4 QL时,出现与拓扑霍尔效应(THE)相关的特征。更令人惊讶的是,当膜厚度进一步减小到3QL时,THE再次消失。理论计算表明,在维度交叉制度的顶部和底部表面状态之间的耦合稳定的磁skyrmion结构,是负责的THE。

英文摘要:

We report transport studies of Mn-doped Bi2Te3 topological insulator (TI) films with accurately controlled thickness grown by molecular beam epitaxy. We find that films thicker than 5 quintuple-layer (QL) exhibit the usual anomalous Hall effect for magnetic TIs. When the thickness is reduced to 4 QL, however, characteristic features associated with the topological Hall effect (THE) emerge. More surprisingly, the THE vanishes again when the film thickness is further reduced to 3 QL. Theoretical calculations demonstrate that the coupling between the top and bottom surface states at the dimensional crossover regime stabilizes the magnetic skyrmion structure that is responsible for the THE.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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