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arXiv 2004.06060cond-mat.mtrl-scicond-mat.supr-con
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金属基底上单层石墨烯的电子-声子耦合常数的He原子散射研究

The Electron-Phonon Coupling Constant for Single-Layer Graphene on Metal Substrates Determined from He Atom Scattering

G. Benedek, J. R. Manson, S. Miret-Artés

摘要:

最近的理论表明,电子-声子耦合强度$λ$的值可以直接从氦原子散射反射率的热衰减(Debye-Waller因子)中提取。该理论在这里扩展到多路半金属系统,并适用于不同的金属基板和石墨上的石墨烯的情况。结果表明,$λ$随着石墨烯-基底结合强度的降低而迅速增加。两种不同的计算模型被认为是产生定性相似的结果的依赖$λ$结合强度。这些模型分别预测具有循环边界条件的假设的平坦独立单层石墨烯的值为$λ_{HAS} = 0.89$和0.32。该方法不仅适用于这里考虑的石墨烯覆盖层的分析和表征,而且适用于其他分层系统,如扭曲的石墨烯双层。

英文摘要:

Recent theory has demonstrated that the value of the electron-phonon coupling strength $λ$ can be extracted directly from the thermal attenuation (Debye-Waller factor) of Helium atom scattering reflectivity. This theory is here extended to multivalley semimetal systems and applied to the case of graphene on different metal substrates and graphite. It is shown that $λ$ rapidly increases for decreasing graphene-substrate binding strength. Two different calculational models are considered which produce qualitatively similar results for the dependence of $λ$ on binding strength. These models predict, respectively, values of $λ_{HAS} = 0.89$ and 0.32 for a hypothetical flat free-standing single-layer graphene with cyclic boundary conditions. The method is suitable for analysis and characterization of not only the graphene overlayers considered here, but also other layered systems such as twisted graphene bilayers.

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