arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1902.01033cond-mat.mtrl-sci
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一种高熵硅化物(Mo0.2Nb 0.2Ta 0.2Ti 0.2W 0.2)Si2

A High-Entropy Silicide: (Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si2

Joshua Gild, Jeffrey Braun, Kevin Kaufmann, Eduardo Marin, Tyler Harrington, Patrick Hopkins, Kenneth Vecchio, Jian Luo

摘要:

成功地合成了高熵金属二硅化物(Mo_(0.2)Nb_(0.2)Ta_(0.2)W_(0.2))Si_2。X射线衍射(XRD)、能量色散X射线光谱(EDX)和电子背散射衍射(EBSD)共同显示了单个高熵硅化物相的形成。该高熵(Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si 2具有六方C40晶体结构,具有ABC堆垛序列和点群P6222。这一发现将已知的高熵材料家族从金属、氧化物、硼化物、碳化物和氮化物扩展到硅化物,这是我们所知的第一次,同时也证明了一种新的非立方晶体结构(具有较低的对称性)可以制成高熵材料。该(Mo0.2Nb0.2Ta0.2W0.2)Si 2显示出16.7 ± 1.9GPa的高纳米硬度和11.6 ± 0.5GPa的维氏硬度。此外,它具有6.9 ± 1.1 W m-1 K-1的低热导率,这比广泛使用的四相MoSi 2低大约一个数量级,并且是具有相同晶体结构的六方NbSi 2和TaSi 2的那些报道值的约1/3。

英文摘要:

A high-entropy metal disilicide, (Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si2, has been successfully synthesized. X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDX), and electron backscatter diffraction (EBSD) collectively show the formation of a single high-entropy silicide phase. This high-entropy (Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si2 possesses a hexagonal C40 crystal structure with ABC stacking sequence and a point group of P6222. This discovery expands the known families of high-entropy materials from metals, oxides, borides, carbides, and nitrides to a silicide, for the first time to our knowledge, as well as demonstrating that a new, non-cubic, crystal structure (with lower symmetry) can be made into high-entropy. This (Mo0.2Nb0.2Ta0.2Ti0.2W0.2)Si2 exhibits high nanohardness of 16.7 +- 1.9 GPa and Vickers hardness of 11.6 +- 0.5 GPa. Moreover, it has a low thermal conductivity of 6.9 +- 1.1 W m-1 K-1, which is approximately one order of magnitude lower than that of the widely-used tetragonal MoSi2 and ~1/3 of those reported values for the hexagonal NbSi2 and TaSi2 with the same crystal structure.

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