There is a wide range of science and applications accessible via the strain engineering of quantum transport in 2D materials. We propose a realistic experimental platform for uniaxial strain engineering of ballistic charge transport in graphene. We then develop an applied theoretical model, based on this platform, to calculate charge conductivity and demonstrate graphene quantum strain transistors (GQSTs). We define GQSTs as mechanically strained ballistic graphene transistors with on/off conductivity ratios $> 10^{4}$, and which can be operated via modest gate voltages. Such devices would permit excellent transistor operations in pristine graphene, where there is no band gap. We consider all dominant uniaxial strain effects on conductivity, while including experimental considerations to guide the realization of the proposal. We predict multiple strain-tunable transport signatures, and demonstrate that a broad range of realistic device parameters lead to robust GQSTs. These devices could find applications in flexible electronic transistors, strain sensors, and valleytronics.
Transport Properties of Graphene Nanoribbon Transistors on Transport Properties of Graphene Nanoribbon Transistors on Chemical-Vapor-Deposition Grown Wafer-Scale Graphene
The past decade has seen rapid growth in the research area of graphene and its application to novel electronics. With Moore's law beginning to plateau, the need for post-silicon technology in industry is becoming more apparent. Moreover, existing technology is insufficient for implementing terahertz detectors and receivers, which are required for a number of applications including medical imaging and security scanning. Graphene is considered to be a key potential candidate for replacing silicon in existing CMOS technology as well as realizing field effect transistors for terahertz detection, d…
Bilayer graphene is a promising material for radio-frequency transistors because its energy gap might result in a better current saturation than the monolayer graphene. Because the great deal of interest in this technology, especially for flexible radio-frequency applications, gaining control of it requires the formulation of appropriate models for the drain current, charge and capacitance. In this work we have developed them for a dual-gated bilayer graphene field-effect transistor. A drift-diffusion mechanism for the carrier transport has been considered coupled with an appropriate field-eff…
Graphene/silicon heterostructures have attracted tremendous interest as a new platform for diverse electronic and photonic devices such as barristors, solar cells, optical modulators, and chemical sensors. The studies to date largely focus on junctions between graphene and lightly-doped silicon, where a Schottky barrier is believed to dominate the carrier transport process. Here we report a systematic investigation of carrier transport across the heterojunctions formed between graphene and highly-doped silicon. By varying the silicon doping level and the measurement temperature, we show that t…
We improvise a novel approach to carry out first-principles simulations of graphene-based vertical field effect tunneling transistors that consist of a graphene$|${\it h}-BN$|$graphene multilayer structure. Within the density functional theory framework, we exploit the effective screening medium (ESM) method to properly treat boundary conditions for electrostatic potentials and investigate the effect of gate voltage. The distribution of free carriers and the band structure of both top and bottom graphene layers are calculated self-consistently. The dielectric properties of {\it h}-BN thin film…
The influence of edge vacancies on the working ability of the planar graphene tunnel field-effect transistor (TFET) is studied at various concentrations and distributions (normal, uniform, periodic) of defects. All calculations are performed by using the Green's function method and the tight-binding approximation. It is shown that the transistor performance depends critically on two important factors associated with the defects: the destruction of the edge-localized electronic states and the emergence of subpeaks near the Fermi level. The supportable operation conditions of the TFET are found …
Top-gated graphene field-effect-transistors formed by decomposition of SiC
在热分解的半绝缘4 H-SiC衬底上制作了顶栅少层石墨烯场效应晶体管。物理气相沉积的SiO2被用作栅极电介质。通过高分辨率扫描隧道显微镜观察到的具有正确晶格矢量的碳原子的二维六边形排列证实了在SiC衬底顶部形成多个石墨烯层。n型和p型跃迁的观察进一步证实了狄拉克费米子在石墨烯层中独特的输运性质。在这些制造的石墨烯FET上测得的电子和空穴迁移率分别高达5400 cm 2/Vs和4400 cm 2/Vs，这比常规SiC或硅的相应值大得多。
We demonstrate a graphene-MoS2 architecture integrating multiple field-effect transistors and we independently probe and correlate the conducting properties of van der Waals coupled graphene-MoS2 contacts with the ones of the MoS2 channels. Devices are fabricated starting from high-quality single-crystal monolayers grown by chemical vapor deposition and characterized by scanning Raman and photoluminescence spectroscopies. Transconductance curves of MoS2 are compared with the current-voltage characteristics of graphene contact stripes, revealing a significant suppression of transport on the n-s…
We have investigated low-frequency 1/f noise in the boron nitride - grapheme - boron nitride heterostructure field - effect transistors on Si/SiO2 substrates (f is a frequency). The device channel was implemented with a single layer graphene encased between two layers of hexagonal boron nitride. The transistors had the charge carrier mobility in the range from 30000 to 36000 cm2/Vs at room temperature. It was established that the noise spectral density normalized to the channel area in such devices can be suppressed to 5 x 10^-9 μm2 Hz^-1, which is a factor of x5 - x10 lower than that in non-e…
Effect of back-gate on contact resistance and on channel conductance in graphene-based field-effect transistors
研究了单层和双层石墨烯背栅场效应晶体管的接触电阻和传输特性。我们分别测量了Ni和Ti的约7kohm* um 2和约30kohm* um 2的比接触电阻率。我们发现，接触电阻是一个显着的贡献者的总源漏电阻，它是调制的背栅电压。我们测量的传输特性，显示双浸功能，我们解释为掺杂的影响，由于从接触引起的最小状态密度的接触下，在不同的栅极电压的沟道中的石墨烯的电荷转移。
Realization of a High Mobility Dual-gated Graphene Field Effect Transistor with Al2O3 Dielectric
我们制作和表征双栅石墨烯场效应晶体管（FET）使用氧化铝作为顶栅电介质。我们使用薄Al膜作为成核层，以使Al 2 O3的原子层沉积。我们的器件在室温下显示出超过8,000 cm 2/Vs的迁移率值，这一发现表明顶栅叠层不会显著增加载流子散射，从而降低器件特性。我们提出了一个设备模型，以适应使用一个单一的流动性值的实验数据。
Bottom-up assembled nanomaterials and nanostructures allow for the studies of rich and unprecedented quantum-related and mesoscopic transport phenomena. However, it can be difficult to quantify the correlations between the geometrical or structural parameters obtained from advanced microscopy and measured electrical characteristics when they are made into macroscopic devices. Here, we propose a strategy to connect the nanomaterial morphologies and the device performance through a Monte Carlo device model and apply it to understand the scaling trends of bottom-up synthesized armchair graphene n…
Self-aligned graphene field-effect transistors with polyethyleneimine doped source/drain access regions
我们报道了一种采用聚乙烯亚胺旋涂掺杂源极/漏极接入区制造自对准顶栅石墨烯场效应晶体管（GFET）的方法，与未掺杂器件相比，该方法导致接入电阻降低2倍，器件电特性改善2.5倍。Si/SiO $_2$衬底上的GFET具有高达6，300 cm $^2$ /Vs的高载流子迁移率。自对准旋涂掺杂适用于任意衬底上的GFET，如绝缘石英衬底上的GFET的性能提高3倍所证明的，其更适合于射频应用。
We study the effects of low-energy electron beam irradiation up to 10 keV on graphene based field effect transistors. We fabricate metallic bilayer electrodes to contact mono- and bi-layer graphene flakes on SiO$_2$, obtaining specific contact resistivity $ρ_c \simeq 19 kΩμm^2$ and carrier mobility as high as 4000 cm$^2$V$^{-1}$s$^{-1}$. By using a highly doped p-Si/SiO$_2$ substrate as back gate, we analyze the transport properties of the device and the dependence on the pressure and on the electron bombardment. We demonstrate that low energy irradiation is detrimental on the transistor curre…
We report the batch fabrication of graphene field-effect-transistors (GFETs) with nanoperforated graphene as channel. The transistors were cut and encapsulated. The encapsulated GFETs display saturation regions that can be tuned by modifying the top gate voltage, and have on/off ratios of up to 10^8 at room temperature. In addition, the nanoperforated GFETs display orders of magnitude higher photoresponses than any room-temperature graphene detector configurations that do not involve heterostructures with bandgap materials.
We fabricate back-gated field effect transistors using Niobium electrodes on mechanically exfoliated monolayer graphene and perform electrical characterization in the pressure range from atmospheric down to 10-4 mbar. We study the effect of room temperature vacuum degassing and report asymmetric transfer characteristics with a resistance plateau in the n-branch. We show that weakly chemisorbed Nb acts as p-dopant on graphene and explain the transistor characteristics by Nb/graphene interaction with unpinned Fermi level at the interface.
We report room-temperature Coulomb blockade in a single layer graphene three-terminal single-electron transistor (SET) fabricated using feedback-controlled electroburning. The small separation between the side gate electrode and the graphene quantum dot results in a gate coupling up to 3 times larger compared to the value found for the back gate electrode. This allows for an effective tuning between the conductive and Coulomb blocked state using a small side gate voltage of about 1V. The technique can potentially be used in the future to fabricate all-graphene based room temperature single-ele…
Tens of graphene transistors with nanoperforated channels and different channel lengths were fabricated at the wafer scale. The nanoholes have a central diameter of 20 nm and a period of 100 nm, the lengths of the channel being of 1, 2, 4 or 8 micrometers. We have found that the mobility in these 2 micrometer-wide transistors varies from about 10400 cm2/Vs for a channel length of 1 micrometer to about 550 cm2/Vs for a channel length of 8 micrometer. Irrespective of the mobility value, in all transistors the on-off ratio is in the range 10^3-10^4 at drain and gate voltages less than 2 V. The ch…
This work evaluates the performance of carbon nanotube field effect transistors (CNTFET) using few layer graphene as the contact electrode material. We present the experimental results obtained on the barrier height at CNT graphene junction using temperature dependent IV measurements. The estimated barrier height in our devices for both holes and electrons is close to zero or slightly negative indicating the Ohmic contact of graphene with the valence and conduction bands of CNTs. In addition, we also report that there is no correlation between the barrier height and thickness of graphene.
