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arXiv 1506.04083cond-mat.mes-hallcond-mat.mtrl-sci
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近弹道h-BN-graphene-h-BN异质结场效应晶体管1/f噪声的抑制

Suppression of 1/f Noise in Near-Ballistic h-BN-Graphene-h-BN Heterostructure Field-Effect Transistors

Maxim A. Stolyarov, Guanxiong Liu, Sergey L. Rumyantsev, Michael Shur, Alexander A. Balandin

摘要:

我们研究了Si/SiO_2衬底上的氮化硼-石墨烯-氮化硼异质结场效应晶体管的低频1/f噪声(f为频率)。该器件沟道是用包裹在两层六方氮化硼之间的单层石墨烯实现的。该晶体管在室温下的载流子迁移率在30000至36000 cm 2/Vs的范围内。已经确定,在这种器件中,归一化到沟道面积的噪声谱密度可以被抑制到5 x 10^-9 μm2 Hz^-1,这比Si/SiO2上的非封装石墨烯器件低x5 - x10倍。噪声抑制的物理机制归因于沟道中的载流子与SiO2栅介质中的陷阱和表面缺陷的屏蔽。所得结果对石墨烯的电子和光电应用具有重要意义。

英文摘要:

We have investigated low-frequency 1/f noise in the boron nitride - grapheme - boron nitride heterostructure field - effect transistors on Si/SiO2 substrates (f is a frequency). The device channel was implemented with a single layer graphene encased between two layers of hexagonal boron nitride. The transistors had the charge carrier mobility in the range from 30000 to 36000 cm2/Vs at room temperature. It was established that the noise spectral density normalized to the channel area in such devices can be suppressed to 5 x 10^-9 μm2 Hz^-1, which is a factor of x5 - x10 lower than that in non-encapsulated graphene devices on Si/SiO2. The physical mechanism of noise suppression was attributed to screening of the charge carriers in the channel from traps in SiO2 gate dielectric and surface defects. The obtained results are important for the electronic and optoelectronic applications of graphene.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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