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arXiv 1607.05902cond-mat.mes-hall
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大谷霍尔角下的非局域拓扑谷输运

Nonlocal topological valley transport at large valley Hall angles

Michael Beconcini, Fabio Taddei, Marco Polini

摘要:

具有破缺反转对称性的二维材料中的Berry曲率热点是导致横向谷电流存在的原因,横向谷电流产生巨大的非局域直流电压。最近的实验在高品质的间隙石墨烯强调了饱和的非局部电阻作为纵向电荷电阻率$ρ_{{\rm c}, xx}$的函数,当系统被驱动到绝缘相深处。到目前为止,这种饱和的根源尚不清楚。在这项工作中,我们表明,这种行为是完全兼容的大谷霍尔角(VHAs)的制度与散装拓扑运输。我们证明,对于一个固定值的谷扩散长度,$ρ_{{\rm c}, xx}$的非局部电阻的依赖性减弱,增加VHA,从标准的$ρ^3_{{\rm c}, xx}$幂律过渡到一个结果,是独立的$ρ_{{\rm c}, xx}$。

英文摘要:

Berry curvature hot spots in two-dimensional materials with broken inversion symmetry are responsible for the existence of transverse valley currents, which give rise to giant nonlocal dc voltages. Recent experiments in high-quality gapped graphene have highlighted a saturation of the nonlocal resistance as a function of the longitudinal charge resistivity $ρ_{{\rm c}, xx}$, when the system is driven deep into the insulating phase. The origin of this saturation is, to date, unclear. In this work we show that this behavior is fully compatible with bulk topological transport in the regime of large valley Hall angles (VHAs). We demonstrate that, for a fixed value of the valley diffusion length, the dependence of the nonlocal resistance on $ρ_{{\rm c}, xx}$ weakens for increasing VHAs, transitioning from the standard $ρ^3_{{\rm c}, xx}$ power-law to a result that is independent of $ρ_{{\rm c}, xx}$.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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