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arXiv 1605.03342cond-mat.mes-hall
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有限隙HgTe量子阱中的高温量子霍尔效应

High-temperature quantum Hall effect in finite gapped HgTe quantum wells

T. Khouri, M. Bendias, P. Leubner, C. Brüne, H. Buhmann, L. W. Molenkamp, U. Zeitler, N. E. Hussey, S. Wiedmann

摘要:

我们报告的观察量子霍尔效应在高温下的碲化汞量子阱具有有限的带隙和厚度低于和高于临界厚度$d_\textnormal{c}$,从一个二维的拓扑绝缘体的传统半导体。在高载流子浓度下,我们观察到量子化的霍尔电导率高达60,K,朗道能级之间的能隙为25,meV的数量级,与从$\mathbf{k\cdot p}$计算获得的朗道能级谱很好地一致。使用在$ν=2\rightarrow 1$的平台-平台转变的标度方法,我们发现标度系数$κ=0.45 \pm 0.04$与标度理论的普适性是一致的,我们没有发现增加的电子-声子相互作用的迹象,以改变标度,即使在这些升高的温度。将有限带隙的碲化汞量子阱中量子化霍尔电阻的高温极限与石墨烯中的室温实验进行比较,发现量子化击穿时的能隙超过了热能相同数量级。

英文摘要:

We report on the observation of the quantum Hall effect at high temperatures in HgTe quantum wells with a finite band gap and a thickness below and above the critical thickness $d_\textnormal{c}$ that separates a conventional semiconductor from a two-dimensional topological insulator. At high carrier concentrations we observe a quantized Hall conductivity up to 60\,K with energy gaps between Landau Levels of the order of 25\,meV, in good agreement with the Landau Level spectrum obtained from $\mathbf{k\cdot p}$-calculations. Using the scaling approach for the plateau-plateau transition at $ν=2\rightarrow 1$, we find the scaling coefficient $κ=0.45 \pm 0.04$ to be consistent with the universality of scaling theory and we do not find signs of increased electron-phonon interaction to alter the scaling even at these elevated temperatures. Comparing the high temperature limit of the quantized Hall resistance in HgTe quantum wells with a finite band gap with room temperature experiment in graphene, we find the energy gaps at the break-down of the quantization to exceed the thermal energy by the same order of magnitude.

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