arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1504.07486cond-mat.str-elcond-mat.mtrl-sci
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拓扑绝缘体Bi1 .5Sb0.5Te1.7Se1.3与Ag、Nb和Fe界面的角分辨和芯能级光电能谱研究

Angle-resolved and core-level photoemission study of interfacing the topological insulator Bi1.5Sb0.5Te1.7Se1.3 with Ag, Nb and Fe

N. de Jong, E. Frantzeskakis, B. Zwartsenberg, Y. K. Huang, D. Wu, P. Hlawenka, J. Sánchez-Barriga, A. Varykhalov, E. van Heumen, M. S. Golden

摘要:

利用高分辨率、角度分辨和芯层光电子能谱研究了体绝缘拓扑绝缘体(TI)与金属吸附原子之间的界面。在Bi_(1.5)Sb_(0.5)Te_(1.7)Se_(1.3)(BSTS)表面上蒸镀了Fe、Nb和Ag。的覆盖率和温度依赖性的吸附和界面形成过程进行了研究,突出的覆盖层的生长上的TI的占据的电子结构的影响。对于所有的覆盖率在室温下和那些相当于在低温下小于0.1单层所有三种金属导致向下移动的TI的频带相对于费米能级。在室温下,银似乎有效地插入BSTS的范德华间隙,伴随着低水平的取代的Te/Se原子的晶体的终端层。这种Te/Se与银的替代显著增加低温吸附,甚至可以主导BSTS近表面区域中的Bi/Sb原子的静电环境。另一方面,Fe和Nb蒸发物保持接近晶体的终端层。在室温下沉积,他们最初取代铋作为覆盖率的函数等电子,取代碲/硒原子之前。对于低温沉积,Fe和Nb对于置换过程来说太不动,并且显示出与表面上的聚集一致的行为。对于Ag和Fe/Nb两者,这些不同的吸附途径导致低温沉积的化学势首先向上移动(n-型掺杂剂行为)并且然后向下移动(p-型行为)的定性相似和显著的行为。

英文摘要:

Interfaces between a bulk-insulating topological insulator (TI) and metallic adatoms have been studied using high-resolution, angle-resolved and core-level photoemission. Fe, Nb and Ag were evaporated onto Bi1.5Sb0.5Te1.7Se1.3 (BSTS) surfaces both at room temperature and 38K. The coverage- and temperature-dependence of the adsorption and interfacial formation process have been investigated, highlighting the effects of the overlayer growth on the occupied electronic structure of the TI. For all coverages at room temperature and for those equivalent to less than 0.1 monolayer at low temperature all three metals lead to a downward shift of the TI's bands with respect to the Fermi level. At room temperature Ag appears to intercalate efficiently into the van der Waals gap of BSTS, accompanied by low-level substitution of the Te/Se atoms of the termination layer of the crystal. This Te/Se substitution with silver increases significantly for low temperature adsorption, and can even dominate the electrostatic environment of the Bi/Sb atoms in the BSTS near-surface region. On the other hand, Fe and Nb evaporants remain close to the termination layer of the crystal. On room temperature deposition, they initially substitute isoelectronically for Bi as a function of coverage, before substituting for Te/Se atoms. For low temperature deposition, Fe and Nb are too immobile for substitution processes and show a behaviour consistent with clustering on the surface. For both Ag and Fe/Nb, these differing adsorption pathways leads to the qualitatively similar and remarkable behavior for low temperature deposition that the chemical potential first moves upward (n-type dopant behavior) and then downward (p-type behavior) on increasing coverage.

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