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arXiv 1306.5664cond-mat.str-el
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近藤绝缘体SmB6带隙表面态的光电子能谱观察

Observation of in-gap surface states in the Kondo insulator SmB6 by photoemission

J. Jiang, S. Li, T. Zhang, Z. Sun, F. Chen, Z. R. Ye, M. Xu, Q. Q. Ge, S. Y. Tan, X. H. Niu, M. Xia, B. P. Xie, Y. F. Li, X. H. Chen, H. H. Wen, D. L. Feng

摘要:

近藤绝缘体(KIs)是一种强关联材料,其中4f和传导电子之间的相互作用导致在低温下杂化能隙打开1-2。SmB 6是典型的KI,但其电阻率在低温下不发散,这归因于一些带隙状态3-10。然而,经过几十年的研究,间隙态的性质和起源仍然不清楚。最近的能带计算和输运测量表明,带隙内态实际上可以归因于拓扑表面态。因此,SmB 6可能是拓扑近藤绝缘体(TKI)13的第一个实现,拓扑近藤绝缘体(TKI)13是拓扑绝缘体(TI)11,12的强相关版本。在这里,通过进行角分辨光电子能谱(ARPES),我们直接观察到几个分散状态内的SmB 6的杂化间隙,跨越费米能级,并显示出可忽略的kz依赖性,表明它们的表面起源。此外,圆二色性(CD)的ARPES结果的间隙状态建议的轨道动量的手性,和温度相关的测量表明,间隙状态的同时消失的杂化间隙约150 K。这些都有力地表明了它们可能的拓扑起源。

英文摘要:

Kondo insulators (KIs) are strongly correlated materials in which the interactions between 4f and conduction electrons lead to a hybridization gap opening at low temperature 1-2. SmB6 is a typical KI, but its resistivity does not diverge at low temperatures, which was attributed to some in-gap states 3-10. However after several decades of research, the nature and origin of the in-gap states remain unclear. Recent band calculation and transport measurements suggest that the in-gap states could actually be ascribed to topological surface states. SmB6 thus might be the first realization of topological Kondo insulator (TKI) 13, the strongly correlated version of topological insulator (TI) 11,12. Here by performing angle-resolved photoemission spectroscopy (ARPES), we directly observed several dispersive states within the hybridization gap of SmB6, which cross the Fermi level and show negligible kz dependence, indicative of their surface origin. Furthermore, the circular dichroism (CD) ARPES results of the in-gap states suggest the chirality of orbital momentum, and temperature dependent measurements have shown that the in-gap states vanish simultaneously with the hybridization gap around 150 K. These strongly suggest their possible topological origin.

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