Elastic properties of materials are an important factor in their integration in applications. Chemical vapor deposited (CVD) monolayer semiconductors are proposed as key components in industrial-scale flexible devices and building blocks of 2D van der Waals heterostructures. However, their mechanical and elastic properties have not been fully characterized. Here we report high 2D elastic moduli of CVD monolayer MoS2 and WS2 (~ 170 N/m), which is very close to the value of exfoliated MoS2 monolayers and almost half the value of the strongest material, graphene. The 2D moduli of their bilayer heterostructures are lower than the sum of 2D modulus of each layer, but comparable to the corresponding bilayer homostructure, implying similar interactions between the hetero monolayers as between homo monolayers. These results not only provide deep insight to understanding interlayer interactions in 2D van der Waals structures, but also potentially allow engineering of their elastic properties as desired.
The vapor phase synthesis of two-dimensional transition-metal dichalcogenides (MX2) and their heterostructures is often poorly reproducible and sensitive to uncontrolled environmental humidity. It was recently realized that water vapor can play important roles in the growth of MX2 by reacting with MX2 at high temperature to form volatile metal oxyhydroxide (MOx(OH)y) and hydrogen chalcogenides (H2X) that dramatically change the growth processes. Here we report the controllable synthesis of WS2, MoS2, and their heterostructures using water-assisted chemical vapor transport (CVT). The water vapo…
High mobility and high on/off ratio field-effect transistors based on chemical vapor deposited single-crystal MoS2 grains
我们报告了场效应晶体管（FET）与单晶二硫化钼（MoS 2）的化学气相沉积（CVD）合成的通道。对于双层MoS 2 FET，迁移率为~17 cm ~ 2 V ~（-1）s ~（-1），开/关电流比为~108，这比基于CVD多晶MoS 2膜的FET高得多。通过避免由转移过程引入的晶界和污染的有害影响，直接沉积在SiO2上的CVD MoS 2原子层的质量与最佳剥离的MoS 2薄片相当。结果表明，CVD法是制备高质量MoS_2原子层的一种可行方法。
Glasses are nonequilibrium solids with properties highly dependent on their method of preparation. In vapor-deposited molecular glasses, structural organization could be readily tuned with deposition rate and substrate temperature. Herein, we show the atomic arrangement of strong network forming GeO2 glass is modified at medium range (< 2 nm) through vapor deposition at elevated temperatures. Raman spectral signatures distinctively show the population of 6-membered GeO4 rings increases at elevated substrate temperatures. Deposition near the glass transition temperature is more efficient than p…
Vapor deposition can yield glasses that are more stable than those obtained by the traditional melt-quenching route. However, it remains unclear whether vapor-deposited glasses are "allowable" or "forbidden," that is, if they are equivalent to glasses formed by cooling extremely slowly a liquid or if they differ in nature from melt-quenched glasses. Here, based on reactive molecular dynamics simulation (MD) of silica glasses, we demonstrate that the allowable or forbidden nature of vapor-deposited glasses depends on the temperature of the substrate and, in turn, is found to be encoded in their…
Large-area two-dimensional (2D) materials for technical applications can now be produced by chemical vapor deposition (CVD). Unfortunately, grain boundaries (GBs) are ubiquitously introduced as a result of the coalescence of grains with different crystallographic orientations. It is well known that the properties of materials largely depend on GB structures. Here, we carried out a systematic study on the GB structures in CVD-grown polycrystalline h-BN monolayer films by transmission electron microscope. Interestingly, most of these GBs are revealed to be formed via overlapping between neighbor…
Graphene is a material with enormous potential for numerous applications. Therefore, significant efforts are dedicated to large-scale graphene production using a chemical vapor deposition (CVD) technique. In addition, research is directed at developing methods to incorporate graphene in established production technologies and process flows. In this paper, we present a brief review of available CVD methods for graphene synthesis. We also discuss scalable methods to transfer graphene onto desired substrates. Finally, we discuss potential applications that would benefit from a fully scaled, semic…
Absolute X-ray reflectivity of chemically vapor deposited (CVD) diamond single crystals was measured in the Laue geometry in the double-crystal non-dispersive setting with an asymmetric Si beam conditioner crystal. The measurements were supplemented by rocking curve topography. The measured reflectivity curves are examined in the framework of Darwin-Hamilton approach using a set of two independent parameters, the characteristic thickness of mosaic blocks and their average angular misorientation. Due to strong extinction effects the width of reflectivity curves does not directly represent the a…
We investigate the low temperature properties of two-dimensional Lennard-Jones glass films, prepared in silico both by liquid cooling and by physical vapor deposition. We identify deep in the solid phase a crossover temperature $T^*$, at which slow dynamics and enhanced heterogeneity emerge. Around $T^*$, localized defects become visible, leading to vibrational anomalies as compared to standard solids. We find that on average, $T^*$ decreases in samples with lower inherent structure energy, suggesting that such anomalies will be suppressed in ultra-stable glass films, prepared both by very slo…
Hexagonal boron nitride (h-BN) is a two dimensional (2D) layered insulator with superior dielectric performance that offers excellent interaction with other 2D materials (e.g. graphene, MoS2). Large-area h-BN can be readily grown on metallic substrates via chemical vapor deposition (CVD), but the impact of local inhomogeneities on the electrical properties of the h-BN and their effect in electronic devices is unknown. Here it is shown that the electrical properties of h-BN stacks grown on polycrystalline Pt vary a lot depending on the crystalline orientation of the Pt grain, but within the sam…
The deposition of boron-doped amorphous carbon thin films on SiO2 substrate was achieved via a focused ion beam-assisted chemical vapor deposition of triphenyl borane (C18H15B) and triphenyl borate (C18H15BO3). The existence of boron in the deposited film from triphenyl borane, with a precursor temperature of 90 °C, was confirmed by a core level X-ray photoelectron spectroscopy analysis. The film exhibited a semiconducting behavior with a band gap of 285 meV. Although the band gap was decreased to 197 meV after an annealing process, the film was still semiconductor. Additionally, a drastic red…
Amorphous silica (a-SiO2) exhibits unique thermo-mechanical behaviors that set it apart from other glasses. However, there is still limited understanding of how this mechanical behavior is related to the atomic structure and to the preparation conditions of a-SiO2. Here, we used electron beam (e-beam) physical vapor deposition (PVD) to prepare a series of a-SiO2 films grown at different substrate temperatures and then combined molecular simulations with Positronium Annihilation Lifetime Spectroscopy and nanoindentation experiments to establish relations among processing, structure, and mechani…
The two-dimensional (2D) semiconductor molybdenum disulfide (MoS2) has attracted widespread attention for its extraordinary electrical, optical, spin and valley related properties. Here, we report on spin polarized tunneling through chemical vapor deposited (CVD) multilayer MoS2 (~7 nm) at room temperature in a vertically fabricated spin-valve device. A tunnel magnetoresistance (TMR) of 0.5 - 2 % has been observed, corresponding to spin polarization of 5 - 10 % in the measured temperature range of 300 - 75 K. First principles calculations for ideal junctions results in a tunnel magnetoresistan…
Electronic Transport in Chemical Vapor Deposited Graphene Synthesized on Cu: Quantum Hall Effect and Weak Localization
我们报告的电子性质的石墨烯合成的化学气相沉积（CVD）铜，然后转移到SiO2/Si。已经合成了晶圆级（高达4英寸）石墨烯膜，如光谱拉曼映射所示，主要由单层石墨烯组成。在由这种CVD石墨烯制造的微型器件上进行低温输运测量，显示双极场效应（开/关比约为5，载流子迁移率高达约3000 cm ^2/Vs）和“半整数”量子霍尔效应，这是单层石墨烯的固有电子性质的标志。我们还观察到弱本地化和提取信息的相位相干性和散射的载波。
We report on the growth and characterization of metalorganic vapor-phase epitaxy-grown \b{eta}-(AlxGa1-x)2O3/\b{eta}-Ga2O3 modulation-doped heterostructures. Electron channel is realized in the heterostructure by utilizing a delta-doped \b{eta}-(AlxGa1-x)2O3 barrier. Electron channel characteristics are studied using transfer length method, capacitance-voltage and Hall measurements. Hall sheet charge density of 1.06 x 1013 cm-2 and mobility of 111 cm2/Vs is measured at room temperature. Fabricated transistor showed peak current of 22 mA/mm and on-off ratio of 8 x 106. Sheet resistance of 5.3 k…
In-situ NMR spin-lattice relaxation measurements were performed on several vapor deposited ices. The measurements, which span more than 6 orders of magnitude in relaxation times, show a complex spin-lattice relaxation pattern that is strongly dependent on the growth conditions of the sample. The relaxation patterns change from multi-timescale relaxation for samples grown at temperatures below the amorphous-crystalline transition temperature to single exponential recovery for samples grown above the transition temperature. The slow-relaxation contribution seen in cold-grown samples exhibits a t…
Despite the numerous reports on the topic, examples of chemical vapor deposited (CVD) graphene-based anticorrosive coatings able to provide long-term protection (i.e., several months) of metals are still unavailable. Here, we finally present a polymer-graphene hybrid coating, comprising two single layers of CVD graphene sandwiched by three layers of polyvinyl butyral, that provides complete corrosion protection to commercial aluminum alloys even after 120 days of exposure to simulated seawater. The essential role played by graphene in the hybrid coating is evident when we compare the results f…
We examine different cases of heterostructures consisting of WS2 monolayers grown by chemical vapor deposition (CVD) as the optically active material. We show that the degree of valley polarization of WS2 is considerably influenced by the material type used to form the heterostructure. Our results suggest the interaction between WS2 and graphene (WS2/Gr) has a strong effect on the temperature dependent depolarization (i.e. decrease of polarization with increasing temperature), with polarization degrees reaching 24% at room temperature under near-resonant excitation. This contrasts to hBN- enca…
We control the anisotropic molecular packing of vapor-deposited glasses of ABH113, a deuterated anthracene derivative with promise for future OLED materials, by changing the deposition rate and substrate temperature at which they are prepared. We find that, at substrate temperatures from 0.65Tg to 0.92Tg, deposition rate significantly modifies the orientational order in the vapor-deposited glasses as characterized by X-ray scattering and birefringence. Both measures of anisotropic order can be described by a single deposition rate-substrate temperature superposition (RTS). This supports the ap…
Uniaxial Magnetic Anisotropy and Type-X/Y Current-Induced Magnetization Switching in Oblique-Angle-Deposited Ta/CoFeB/Pt and W/CoFeB/Pt Heterostructures
Using Deposition Rate and Substrate Temperature to Manipulate Liquid Crystal-like Order in a Vapor-deposited Hexagonal Columnar Glass
University of Wisconsin – Madison（威斯康星大学麦迪逊分校）；University of Colorado Boulder（科罗拉多大学博尔德分校）；Centre de Recherche Paul Pascal, CNRS & Université de Bordeaux（保罗·帕斯卡研究中心，法国国家科学研究中心与波尔多大学）
We report on silicon delta doping of metalorganic vapor-phase epitaxy-grown \b{eta}-Ga2O3 thin films using silane precursor. Delta-doped \b{eta}-Ga2O3 epitaxial films are characterized using capacitance-voltage profiling and secondary-ion mass spectroscopy. Electron sheet charge density in the range of 2.9e12 cm-2 to 8e12 cm-2 with a half width at half maximum ranging from 6.2 nm to 3.5 nm is measured. We also demonstrate a high density (6.4e12 cm-2) degenerate two-dimensional electron gas using a delta-doped \b{eta}-(Al0.26Ga0.74)2O3/\b{eta}-Ga2O3 heterostructure.The total charge could also i…
We performed Scanning Thermal Microscopy measurements on single layers of chemical-vapor-deposited -CVD- graphene supported by different substrates, namely SiO2, Al2O3 and PET using a double-scan technique to remove the contribution to the heat flux through the air and the cantilever. Then, by adopting a simple lumped-elements model, we developed a new method that allows determining, through a multi-step numerical analysis, the equivalent thermal properties of thermally conductive coatings of nanometric thickness. In this specific case we found that our CVD graphene is thermally equivalent, fo…
Illumination and annealing characteristics of two-dimensional electron gas systems in metal-organic vapor-phase epitaxy grown AlGaN/AlN/GaN heterostructures
研究了两种不同Al组分（x=0.15和x=0.25）的AlGaN/AlN/GAN异质结的持续光电导（PPC）效应。利用Shubnikov-de Haas和Hall测量方法研究了AlN/GAN异质界面处形成的二维电子气。利用光学照射，我们能够将Al 0.15 Ga 0.85 N/AlN/GAN样品的载流子密度从1.6 × 10 ^{12} cm^{-2}增加到5.9 × 10 ^{12} cm^{-2}，同时在T = 1.6 K时电子迁移率从9540 cm 2/Vs增加到21400 cm 2/Vs。在这两个样品中的持续光电流表现出强烈的依赖于照明波长，是最高的接近带隙和降低在较长的波长。PPC效应对于长于530 nm的照明波长变得相当弱，并且在光谱的红外区域（>700 nm）中显示出具有初始负光电导的更复杂的响应。Al0.25Ga0.75N/AlN/GAN和Al0.15Ga0.85N/AlN/GAN样品在390 nm照射下的最大PPC效率分别为0.011%和0.005%。在光照后，可以通过退火样品来降低载流子密度。在20-280 K温度范围内研究了PPC效应的退火特性。我们发现，在280 K退火是不足以完全恢复的载流子密度。事实上，即使在室温下，PPC效应也发生在这些样品中。比较两种样品的测量结果，Al0.25Ga0.75N/AlN/GAN样品具有较大的光照响应，并显示出较小的恢复与…
The growth of ZnTe nanowires and ZnTe-CdTe nanowire heterostructures is studied by \emph{in situ} transmission electron microscopy. We describe the shape, and the change of shape, of the solid gold nanoparticle during vapor-solid-solid growth. We show the balance between one-monolayer and two-monolayer steps which characterizes the vapor-liquid-solid and vapor-solid-solid growth modes of ZnTe. We discuss the role of the mismatch strain and lattice coincidence between gold and ZnTe on the predominance of two-monolayer steps during vapor-solid-solid growth, and on the subsequent self-regulation …
Mn as surfactant for the self-assembling of Al$_x$Ga$_{1-x}$N/GaN layered heterostructures
GAN和Al $_x$ Ga $_{1-x}$ N/GAN异质结构在Mn存在下通过金属有机气相外延生长的结构分析揭示了Mn如何影响生长过程，特别是Al的掺入、表面的形态以及GAN上的Al $_x$ Ga $_{1-x}$ N的塑性弛豫。此外，Mn的掺杂促进了层状Al $_x$ Ga $_{1-x}$ N/GAN超晶格异质结构的形成，为控制晶体生长过程中三元合金的偏析和促进功能层状结构的自组装开辟了广阔的前景。
Interfacial roughness and proximity effects in superconductor/ferromagnet CuNi/Nb heterostructures
本文报道了用磁控溅射法制备的Nb/Cu $_{60}$ Ni $_{40}$混合超导/铁磁体（S/F）双层膜的结构和电子性质。X射线和中子反射测量表明，沉积在Al $_2$ O $_3$（1 $\bar{1}$ 02）衬底上的异质结构的总界面粗糙度和不同界面粗糙度的垂直相关性都低于沉积在Si（111）衬底上的异质结构。互感实验研究了界面粗糙度对超导转变温度$T_C$的影响。这些测量结果表明，沉积在Al $_2$ O $_3$上的异质结构中的$\sim$比沉积在Si上的异质结构高$T_C$ 4%。我们将这种效应归因于S层中电子的更高平均自由程，这是由界面处的扩散散射的抑制引起的。然而，$T_C$对铁磁层厚度的依赖性在两个系统中没有显著差异，表明库珀对的透明性上的界面粗糙度的微弱影响。
We present a novel transparent conductive support structure for two-dimensional (2D) materials that provides an electronically passive 2D/3D interface while also enabling facile interfacial charge transport. This structure, which comprises an evaporated nanocrystalline carbon (nc-C) film beneath an atomic layer deposited alumina (ALD AlOx) layer, is thermally stable and allows direct chemical vapor deposition (CVD) of 2D materials onto the surface. When the nc-C/AlOx is deposited onto a 270 nm SiO2 layer on Si, strong optical contrast for monolayer flakes is retained. Raman spectroscopy reveal…
We report the discovery of a temperature induced phase transition between the αand βstructures of antimonene. When antimony is deposited at room temperature on bismuth selenide, it forms domains of α-antimonene having different orientations with respect to the substrate. During a mild annealing, the βphase grows and prevails over the αphase, eventually forming a single domain that perfectly matches the surface lattice structure of bismuth selenide. First principles thermodynamics calculations of this van der Waals heterostructure explain the different temperature-dependent stability of the two…
Innovative applications based on two-dimensional solids require cost-effective fabrication processes resulting in large areas of high quality materials. Chemical vapour deposition is among the most promising methods to fulfill these requirements. However, for 2D materials prepared in this way it is generally assumed that they are of inferior quality in comparison to the exfoliated 2D materials commonly used in basic research. In this work we challenge this assumption and aim to quantify the differences in quality for the prototypical transition metal dichalcogenide MoS$_2$. To this end single …
For years, solution processing has provided a versatile platform to extend the applications of transition metal dichalcogenides (TMDs) beyond those achievable with traditional preparation methods. However, existing solution-based synthesis and exfoliation approaches are not compatible with complex geometries, particularly when interfacial control is desired. As a result, promising TMD structures, including MoS2/WS2 heterostructures, are barred from the rich assembly and modification opportunities possible with solution preparation. Here, we introduce a strategy that combines traditional vapor …
Topological insulator Bi2Te3 films synthesized by metal organic chemical vapor deposition
拓扑绝缘体（TI）材料例如Bi 2 Te 3和Bi 2Se 3最近吸引了强烈的兴趣。大规模、高质量的TI薄膜对于开发TI基器件应用是重要的。本文采用金属有机化学气相沉积（MOCVD）方法在GaAs（001）衬底上制备了Bi 2 Te 3薄膜，并通过X射线衍射（XRD）、拉曼光谱、角分辨光电子能谱（ARPES）和电子输运测量等方法对薄膜的结构和电子性质进行了研究。ARPES测量的电子能带结构清晰地揭示了具有单一Dirac锥的特征拓扑表面态（SS），证实了MOCVD Bi 2 Te 3薄膜的TI性质.电阻率和霍尔效应测量表明，体载流子迁移率相对较高，在300 K时约为350 cm^2/Vs，在15 K时约为7，400 cm^2/Vs。我们还测量了薄膜的塞贝克系数。我们的示范高品质的拓扑绝缘体薄膜生长的一个简单的和可扩展的方法是利益的基础研究和实际应用的热电和TI材料。
