arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2103.14880physics.app-phcond-mat.mtrl-sci
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化学气相沉积石墨烯:从合成到应用

Chemical vapor deposited graphene: From synthesis to applications

Satender Kataria, Stefan Wagner, Jasper Ruhkopf, Aamit Gahoi, Himadri Pandey, Rainer Bornemann, Sam Vaziri, Anderson D. Smith, Mikael Östling, Max C. Lemme

摘要:

石墨烯是一种具有巨大应用潜力的材料。因此,大量的努力致力于使用化学气相沉积(CVD)技术的大规模石墨烯生产。此外,研究旨在开发将石墨烯纳入现有生产技术和工艺流程的方法。在本文中,我们提出了一个简单的回顾现有的CVD方法用于石墨烯的合成。我们还讨论了将石墨烯转移到所需衬底上的可扩展方法。最后,我们讨论了潜在的应用,将受益于一个完全规模化的,半导体技术兼容的生产工艺。

英文摘要:

Graphene is a material with enormous potential for numerous applications. Therefore, significant efforts are dedicated to large-scale graphene production using a chemical vapor deposition (CVD) technique. In addition, research is directed at developing methods to incorporate graphene in established production technologies and process flows. In this paper, we present a brief review of available CVD methods for graphene synthesis. We also discuss scalable methods to transfer graphene onto desired substrates. Finally, we discuss potential applications that would benefit from a fully scaled, semiconductor technology compatible production process.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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