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arXiv 1301.1192cond-mat.mtrl-sci
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离子辐照对石墨烯表面势的调控

Manipulation of the graphene surface potential by ion irradiation

O. Ochedowski, B. Kleine Bussmann, B. Ban d'Etat, H. Lebius, M. Schleberger

摘要:

我们表明,剥离的单层石墨烯的功函数可以修改快速(E_{kin} =92 MeV)的重离子的入射掠射角下的照射。在离子冲击时,在SiC上的石墨烯中产生单独的表面轨迹。由于在这个能量范围内,离子的能量沉积非常局部化,因此结构改变的表面积被限制在每个径迹约0.01 mum^2。开尔文探针力显微镜显示,这些表面轨道由电子改性材料组成,并且几个轨道足以使整个单层薄片的表面电位偏移~ 400 meV。因此,照射将最初的n掺杂石墨烯转变为具有8.5 × 10^{12}个孔/cm ^2的孔密度的p掺杂石墨烯。这种掺杂效应甚至在将辐照样品加热到500°C之后仍然存在。因此,这种电荷转移不是由于吸附物,而是必须归因于注入的原子。本文提出的方法为有效控制石墨烯的载流子浓度开辟了一条新途径。

英文摘要:

We show that the work function of exfoliated single layer graphene can be modified by irradiation with swift (E_{kin}=92 MeV) heavy ions under glancing angles of incidence. Upon ion impact individual surface tracks are created in graphene on SiC. Due to the very localized energy deposition characteristic for ions in this energy range, the surface area which is structurally altered is limited to ~ 0.01 mum^2 per track. Kelvin probe force microscopy reveals that those surface tracks consist of electronically modified material and that a few tracks suffice to shift the surface potential of the whole single layer flake by ~ 400 meV. Thus, the irradiation turns the initially n-doped graphene into p-doped graphene with a hole density of 8.5 x 10^{12} holes/cm^2. This doping effect persists even after heating the irradiated samples to 500°C. Therefore, this charge transfer is not due to adsorbates but must instead be attributed to implanted atoms. The method presented here opens up a new way to efficiently manipulate the charge carrier concentration of graphene.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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