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arXiv 1209.4480cond-mat.mtrl-scicond-mat.mes-hallcond-mat.str-el
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MnSi外延薄膜中Skyrmion的稳健形成和拓扑霍尔效应

Robust formation of skyrmions and topological Hall effect in epitaxial thin films of MnSi

Yufan Li, N. Kanazawa, X. Z. Yu, A. Tsukazaki, M. Kawasaki, M. Ichikawa, X. F. Jin, F. Kagawa, Y. Tokura

摘要:

研究了在Si(111)衬底上生长的B_(20)型MnSi外延薄膜的磁输运性质。洛伦兹透射电子显微镜(TEM)图像和拓扑霍尔效应(THE)都清楚地指出了在宽的温度-磁场区域内skyrmions的稳健形成。新的功能不同的散装MnSi的观察外延MnSi薄膜:一个较短的(近一半)周期的自旋螺旋和skyrmions,和相反的符号的THE。这些观察结果表明,skyrmion引起的THE的多功能超出了目前的理解。

英文摘要:

Magneto-transport properties have been investigated for epitaxial thin films of B20-type MnSi grown on Si(111) substrates. Both Lorentz transmission electron microscopy (TEM) images and topological Hall effect (THE) clearly point to the robust formation of skyrmions over a wide temperature-magnetic field region. New features distinct from those of bulk MnSi are observed for epitaxial MnSi films: a shorter (nearly half) period of the spin helix and skyrmions, and an opposite sign of THE. These observations suggest versatile features of skyrmion-induced THE beyond the current understanding.

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