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arXiv 1206.2525cond-mat.mes-hall
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Si(111)衬底上GaN纳米线的宏微观应变

Macro- and micro-strain in GaN nanowires on Si(111)

Bernd Jenichen, Oliver Brandt, Carsten Pfueller, Pinar Dogan, Mathias Knelangen, Achim Trampert

摘要:

我们通过x射线衍射分析了GAN纳米线系综的应变状态。纳米线是通过分子束外延在Si(111)衬底上自组织生长的。在宏观尺度上,发现纳米线没有应变。然而,纳米线的合并导致了微观应变,其大小在+-0.015%到+-0.03%之间,这种微观应变对低温光致发光光谱中观察到的线宽有贡献。

英文摘要:

We analyze the strain state of GaN nanowire ensembles by x-ray diffraction. The nanowires are grown by molecular beam epitaxy on a Si(111) substrate in a self-organized manner. On a macroscopic scale, the nanowires are found to be free of strain. However, coalescence of the nanowires results in micro-strain with a magnitude from +-0.015% to +-0.03%.This micro-strain contributes to the linewidth observed in low-temperature photoluminescence spectra.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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