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arXiv 1203.5656cond-mat.mes-hallcond-mat.dis-nn
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原子薄MoS2场效应晶体管中电子态的性质

The Nature of Electronic States in Atomically Thin MoS2 Field-Effect Transistors

Subhamoy Ghatak, Atindra Nath Pal, Arindam Ghosh

摘要:

我们目前的低温电输运实验在五个场效应晶体管器件组成的单层,双层和三层二硫化钼薄膜,机械剥离到Si/SiO2衬底。我们的实验表明,在所有的薄膜中的电子态是本地化以及在实验可访问的范围内的栅极电压的室温。这体现在二维(2D)的可变范围跳跃(VRH)在高温下,而低于\sim 30 K的电导率显示振荡结构的栅极电压所产生的共振隧穿在本地化的网站。从VRH的相关能(T0)和电导率的栅电压依赖性,我们认为来自衬底中的陷阱电荷的库仑势是MoS 2场效应器件中无序的主要来源,这也导致载流子局域化。

英文摘要:

We present low temperature electrical transport experiments in five field effect transistor devices consisting of monolayer, bilayer and trilayer MoS2 films, mechanically exfoliated onto Si/SiO2 substrate. Our experiments reveal that the electronic states in all films are localized well up to the room temperature over the experimentally accessible range of gate voltage. This manifests in two dimensional (2D) variable range hopping (VRH) at high temperatures, while below \sim 30 K the conductivity displays oscillatory structures in gate voltage arising from resonant tunneling at the localized sites. From the correlation energy (T0) of VRH and gate voltage dependence of conductivity, we suggest that Coulomb potential from trapped charges in the substrate are the dominant source of disorder in MoS2 field effect devices, which leads to carrier localization as well.

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