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arXiv 1012.5018cond-mat.mtrl-sci
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GaN:Si的金属-绝缘体转变和电子自旋弛豫性质

Properties of metal-insulator transition and electron spin relaxation in GaN:Si

A. Wolos, Z. Wilamowski, M. Piersa, W. Strupinski, B. Lucznik, I. Grzegory, S. Porowski

摘要:

利用电子自旋共振和霍尔效应研究了GAN:Si中掺杂诱导的金属-绝缘体转变特性。当增加掺杂浓度时,在GAN导带底部下方形成Si相关带。单占据Si施主位置的D。带的中心在GAN导带底部以下27 meV,双占据Si状态的D带在GAN导带底部以下2.7 meV。强阻尼的磁矩发生由于填充的D-状态在Si浓度接近金属-绝缘体过渡。同时,缩短电子自旋弛豫时间,由于有限的电子寿命在单占据的D 0带观察。金属-绝缘体转变发生在未补偿施主的临界浓度约为1.6 * 10^18 cm^-3时。金属-绝缘体转变后的电子态表现出双占据态的非磁性特征。

英文摘要:

We investigate properties of doping-induced metal-insulator transition in GaN:Si by means of electron spin resonance and Hall effect. While increasing the doping concentration, Si-related bands are formed below the bottom of the GaN conduction band. The D0 band of single-occupied Si donor sites is centered 27 meV below the bottom of the GaN conduction band, the D- band of double-occupied Si states at 2.7 meV below the bottom of the GaN conduction band. Strong damping of the magnetic moment occurs due to filling of the D- states at Si concentrations approaching the metal-insulator transition. Simultaneously, shortening of electron spin relaxation time due to limited electron lifetime in the single-occupied D0 band is observed. The metal-insulator transition occurs at the critical concentration of uncompensated donors equal to about 1.6 * 10^18 cm^-3. Electronic states in metallic samples beyond the metal-insulator transition demonstrate non-magnetic character of double-occupied states.

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