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arXiv 0705.2565cond-mat.dis-nncond-mat.mes-hallcond-mat.mtrl-sci
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非晶跳跃绝缘体电导的慢弛豫

Slow relaxation of conductance of amorphous hopping insulators

A. L. Burin, V. I. Kozub, Y. M. Galperin, V. Vinokur

摘要:

我们讨论了跳跃绝缘体电导的记忆效应,由于缓慢重排的结构缺陷,导致接近电子跳跃态的极化子的形成。门电压的突然变化和跳跃位点的化学势变化群体的相应位移,然后由于结构缺陷的重排而缓慢松弛。结果,跳跃态的密度变得依赖于与结构缺陷的重排相关的尺度,从而导致过度的时间依赖性导电性。

英文摘要:

We discuss memory effects in the conductance of hopping insulators due to slow rearrangements of structural defects leading to formation of polarons close to the electron hopping states. An abrupt change in the gate voltage and corresponding shift of the chemical potential change populations of the hopping sites, which then slowly relax due to rearrangements of structural defects. As a result, the density of hopping states becomes time dependent on a scale relevant to rearrangement of the structural defects leading to the excess time dependent conductivity.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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