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arXiv 1010.4628cond-mat.mtrl-sci
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Ge-Sb-Te晶体导电性能中的拓扑绝缘行为

Topological insulating behaviour in conducting property of crystalline Ge-Sb-Te

Jeongwoo Kim, Jinwoong Kim, Seung-Hoon Jhi

摘要:

通过第一性原理计算,发现Ge-Sb-Te(GST)相变材料具有拓扑绝缘性质。我们的计算表明,材料成为拓扑绝缘体或开发导电表面类界面态依赖于层堆叠顺序。结果表明,导电界面态起源于GST中的拓扑绝缘Sb_2Te_3层,并对化合物的电子性质至关重要。这些界面态被发现是相当弹性的原子的无序,但敏感的单轴应变。我们提出了破坏GST拓扑绝缘秩序的机制,并研究了被认为是负责GST的非晶化的Ge迁移的作用。

英文摘要:

We report a discovery, through first-principles calculations, that crystalline Ge-Sb-Te (GST) phase-change materials exhibit the topological insulating property. Our calculations show that the materials become topological insulator or develop conducting surface-like interface states depending on the layer stacking sequence. It is shown that the conducting interface states originate from topological insulating Sb2Te3 layers in GSTs and can be crucial to the electronic property of the compounds. These interface states are found to be quite resilient to atomic disorders but sensitive to the uniaxial strains. We presented the mechanisms that destroy the topological insulating order in GSTs and investigated the role of Ge migration that is believed to be responsible for the amorphorization of GSTs.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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