发表机构
P.N. Lebedev Physical Institute of the Russian Academy of Sciences; National Research University "MPEI"; Moscow Institute of Physics and Technology（俄罗斯科学院列别杰夫物理研究所; 国立研究型大学莫斯科动力学院; 莫斯科物理技术学院）
机构由 AI 辅助整理，请以论文原文为准。AI 中文总结
本文通过室温磁控溅射制备非晶MoS$_x$薄膜，发现其具有低光学损耗和约2的折射率，且兼容微纳加工，适合集成光子应用。
AI 中文摘要
尽管目前大量研究集中于探索晶态MoS$_2$作为二维材料，我们展示了室温直流磁控溅射从加压MoS$_2$粉末靶材制备的非晶MoS$_x$薄膜具有与晶态MoS$_2$根本不同的光学性质。研究发现薄膜的硫含量约为$x=1.8$，表明存在硫缺失。这些薄膜在光学上是各向同性的，并表现出相当低的光学损耗，在可见光和近红外光谱范围内折射率约为2。它们与剥离光刻和干法刻蚀的兼容性使得非晶MoS$_x$成为集成光子应用中一种有前景的材料。
英文摘要
While much effort are now concentrated on exploration of crystalline form of MoS$_2$ as a two-dimensional material, we show that room-temperature DC magnetron sputtering from pressurized MoS$_2$ powder target produces amorphous MoS$_x$ films with optical properties fundamentally different from those of crystalline MoS$_2$. The films were found to have a sulfur content of approximately $x=1.8$, indicating sulfur deficiency. They are optically isotropic and exhibit rather low optical losses, with a refractive index of about 2 over the visible and near-infrared spectral range. Their compatibility with lift-off lithography and dry etching makes amorphous MoS$_x$ a promising material for integrated photonic applications.
Comments6 pages, 5 figures
