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arXiv 1007.0291cond-mat.mes-hall
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拓扑绝缘体薄膜的朗道能级

Landau level states on a topological insulator thin film

Zhihua Yang, Jung Hoon Han

摘要:

我们分析了在均匀垂直磁场作用下描述单狄拉克锥族拓扑绝缘体能带结构的四维哈密顿量。表面朗道能级(LL)状态出现,从体能级解耦,并遵循纯二维表面狄拉克哈密顿量的量子化能量色散。一个小的杂交间隙分裂的中央n=0 LL的简并依赖于膜的厚度和场强,可以得到解析。自旋和电荷密度的显式计算表明,表面LL态是本地化的大约一个五重层从表面终止。一些新的表面结合的液体被证明存在于一个较高的朗道能级指数。

英文摘要:

We analyze the four-dimensional Hamiltonian proposed to describe the band structure of the single-Dirac-cone family of topological insulators in the presence of a uniform perpendicular magnetic field. Surface Landau level(LL) states appear, decoupled from the bulk levels and following the quantized energy dispersion of a purely two-dimensional surface Dirac Hamiltonian. A small hybridization gap splits the degeneracy of the central n=0 LL with dependence on the film thickness and the field strength that can be obtained analytically. Explicit calculation of the spin and charge densities show that surface LL states are localized within approximately one quintuple layer from the surface termination. Some new surface-bound LLs are shown to exist at a higher Landau level index.

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